Crystallinity improvement of Hg1-xCdxTe films grown by a liquid-phase epitaxial technique

被引:0
|
作者
Li, B [1 ]
Zhang, XP [1 ]
Zhu, JQ [1 ]
Chu, JH [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
关键词
Hg1-xCdxTe; crystallinity; liquid-phase epitaxy; meltetch;
D O I
暂无
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Work was done, with emphasis on modifying substrate orientation and liquid-phase epitaxy (LPE) mode, to improve the crystallinity of Hg1-xCdxTe epitaxial layers. The results show that the epilayers grown on the 1.2 degrees-2 degrees off (1 1 1)A substrate exhibit better crystal quality and fewer Te precipitates than those grown on other tilted substrates. Further, an adequate meltetch of substrate before LPE provides a fresh surface for epitaxial growth, while a meltetch of the epilayer at the end of LPE prevents spurious growth and melt sticking. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1242 / 1246
页数:5
相关论文
共 45 条
  • [41] Growth of Pb1-xSnxTe (x ≈ 0.12) epitaxial layers by temperature difference under controlled vapor pressure liquid-phase epitaxy
    Nugraha
    Tamura, W
    Itoh, O
    Suto, K
    Nishizawa, J
    JOURNAL OF CRYSTAL GROWTH, 2000, 219 (1-2) : 32 - 39
  • [42] High-quality Ga1-xInxAsySb1-y quaternary layers grown from antimonide-rich solutions by liquid-phase epitaxy
    Wang, JM
    Sun, YM
    Wu, MC
    JOURNAL OF CRYSTAL GROWTH, 1997, 172 (3-4) : 514 - 520
  • [43] Structural and compositional analysis of InBixAsySb(1-x-y) films grown on GaAs(001) substrates by liquid phase epitaxy
    Dixit, VK
    Keerthi, KS
    Bhat, HL
    Bera, P
    Hegde, MS
    APPLIED SURFACE SCIENCE, 2003, 220 (1-4) : 321 - 326
  • [44] Structural and electrical properties of liquid phase epitaxially grown Y1Ba2Cu3Ox films
    Miura, S
    Hashimoto, K
    Wang, F
    Enomoto, Y
    Morishita, T
    PHYSICA C, 1997, 278 (3-4): : 201 - 206
  • [45] YBa2Cu3O7-δ/NdBa2(CU1-xNix)3O7-δ double layers by liquid-phase epitaxial growth
    Yao, X
    Izumi, T
    Hobara, N
    Nakamura, Y
    Izumi, T
    Shiohara, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (3B): : L266 - L268