Examination of operation of PZT-Film-Si-substrate structures as pyroactive memory elements

被引:2
作者
Bravina, S. L.
Morozovsky, N. V.
Remiens, D. [1 ]
Soyer, C.
机构
[1] Univ Sci & Tech Lille Flandres Artois, CNRS, UMR 8520, IEMN,DOAE,MIMM Team, F-59652 Villeneuve Dascq, France
[2] Natl Acad Sci Ukraine, Inst Phys, UA-03028 Kiev, Ukraine
关键词
PZT-film/Si structures; ferroelectric memory; pyroelectric readout; pyroelectric response hysteresis loops;
D O I
10.1080/00150190701368158
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The change of pyroelectric reaction sign observed in ferroelectric materials in consequence of polarization reversal has been consideredfbi-ferroelectric memory (FEM) elements with pyroelectric readout (FEMPyER). For PZT-film/Si-substrate structures, fabricated by RF sputtering, the mutually complementary pyroelectric and electrophysical characterization for examining FEM elements operation in FEMPyER mode was peiformed. Pyroelectric response (U-pi)-applied voltage (V) hysteresis U-pi-V-loops in the current U-pi 1 and voltage U-pi 2 modes, dielectric permittivity-V loops from U-pi 1/U-pi 2 ratio, charge Q-V-, current I-V- and capacity C-V- hysteresis loops are presented. The prospects of development of FEMPyER elements based on PZT-film/Si-substrate structures are considered.
引用
收藏
页码:627 / 635
页数:9
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