Structure and giant magnetoresistance in electrodeposited granular Cu-Co films

被引:29
|
作者
Pattanaik, GR [1 ]
Kashyap, SC [1 ]
Pandya, DK [1 ]
机构
[1] Indian Inst Technol, Dept Phys, Thin Film Lab, New Delhi 110016, India
关键词
giant magnetoresistance; electrodeposited granular film; structure Cu-Co film;
D O I
10.1016/S0304-8853(00)00453-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cu-Co alloy films have been electrodeposited galvanostatically from a single sulphate bath. XRD reveals the as-deposited films to be single phasic metastable FCC alloy of Cu and Co with a grain size of 5-20 nm. Phase separation on annealing forms fine Co granules at the core of Go-rich shells. The grain size grows to 40-60 nm after annealing at 400 degrees C for 1 h. A total phase separation into Cu (FCC) and Co (FCC) is observed after annealing at 700 degrees C. Maximum room-temperature magnetoresistance (MR) of 4% at a magnetic field of 10 kOe was observed for film annealed at 450 degrees C for 1 h. A MR ratio of 7.8% was observed at 20 K in a magnetic field of 3 kOe. The MR was observed to increase with film thickness. Coexistence of typical superparamagnetic and ferromagnetic features is observed in the room-temperature magnetization curves of as-deposited and 400 degrees C annealed films. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:309 / 316
页数:8
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