High-resolution direct-write femtosecond laser technologies

被引：2
|
作者：
Serbin, J [1 ]
Chichkov, B [1 ]
机构：
[1] Laser Zentrum Hannover eV, D-30419 Hannover, Germany
来源：
SOLID STATE LASER TECHNOLOGIES AND FEMTOSECOND PHENOMENA | 2004年 / 5620卷
关键词：
photonic crystals; lithography; femtosecond laser;
D O I：
10.1117/12.583144
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
During the last decade it has been proven that focused femtosecond laser pulses are an ideal tool for micro- and sub-micro-structuring of all kinds of materials. Due to the high intensities that can be achieved in ultrashort pulses they can be applied for machining transparent media within the volume by means of multi-photon absorption. Besides ablative methods, multi-photon absorption can also lead to photo-polymerization of light-sensitive resins, i.e. two-photon polymerization. In this paper we present our latest results on the fabrication of 3D microstructures by means of two-photon polymerization.
引用
收藏
页码：245 / 251
页数：7
相关论文
共 50 条
  • [31] Direct-Write Deposition and Focused-Electron-Beam-Induced Purification of Gold Nanostructures
    Belic, Domagoj
    Shawrav, Mostafa M.
    Gavagnin, Marco
    Stoeger-Pollach, Michael
    Wanzenboeck, Heinz D.
    Bertagnolli, Emmerich
    ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (04) : 2467 - 2479
  • [32] Serial and Parallel Si, Ge, and SiGe Direct-Write with Scanning Probes and Conducting Stamps
    Vasko, Stephanie E.
    Kapetanovic, Adnan
    Talla, Vamsi
    Brasino, Michael D.
    Zhu, Zihua
    Scholl, Andreas
    Torrey, Jessica D.
    Rolandi, Marco
    NANO LETTERS, 2011, 11 (06) : 2386 - 2389
  • [33] Direct-Write Assembly of 3D Hydrogel Scaffolds for Guided Cell Growth
    Barry, Robert A., III
    Shepherd, Robert F.
    Hanson, Jennifer N.
    Nuzzo, Ralph G.
    Wiltzius, Pierre
    Lewis, Jennifer A.
    ADVANCED MATERIALS, 2009, 21 (23) : 2407 - +
  • [34] Lossless Compression Algorithm for REBL Direct-Write E-Beam Lithography System
    Cramer, George
    Liu, Hsin-I
    Zakhor, Avideh
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES II, 2010, 7637
  • [35] Full-chip characterization of compression algorithms for direct-write maskless lithography systems
    Dai, Vito
    Zakhor, Avideh
    Cramer, George
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2010, 9 (01):
  • [36] Femtosecond laser 3D nanofabrication in glass: enabling direct write of integrated micro/nanofluidic chips
    Cheng, Ya
    Liao, Yang
    Sugioka, Koji
    LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING (LAMOM) XIX, 2014, 8967
  • [37] Focal Extension - A Novel Lithography Technique in Direct-Write Laser Lithography to Enable Fine-Pitch Patterning over Large Topography
    Sabbir, Golam
    Iyer, Subramanian S.
    PROCEEDINGS OF THE IEEE 74TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, ECTC 2024, 2024, : 2125 - 2130
  • [38] Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements
    Mackus, A. J. M.
    Thissen, N. F. W.
    Mulders, J. J. L.
    Trompenaars, P. H. F.
    Verheijen, M. A.
    Bol, A. A.
    Kessels, W. M. M.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2013, 117 (20): : 10788 - 10798
  • [39] Research Progress of High-Resolution Direct Laser Writing Lithography Based on Phase Change Thin Film (Invited)
    Guo, Jialong
    Wei, Tao
    Wei, Jingsong
    Hu, Jing
    Cheng, Miao
    Liu, Qianqian
    Wang, Ruirui
    Li, Wanfei
    Liu, Bo
    CHINESE JOURNAL OF LASERS-ZHONGGUO JIGUANG, 2024, 51 (12):
  • [40] Organotin Carboxylate Reagents for Nanopatterning: Chemical Transformations during Direct-Write Electron Beam Processes
    Sharps, Meredith C.
    Frederick, Ryan T.
    Javitz, Madison L.
    Herman, Gregory S.
    Johnson, Darren W.
    Hutchison, James E.
    CHEMISTRY OF MATERIALS, 2019, 31 (13) : 4840 - 4850
12345