共 28 条
Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms
被引:64
作者:
Bruneau, B.
[1
]
Novikova, T.
[1
]
Lafleur, T.
[2
]
Booth, J. P.
[2
]
Johnson, E. V.
[1
]
机构:
[1] Ecole Polytech, CNRS, LPICM, F-91128 Palaiseau, France
[2] Ecole Polytech, CNRS, LPP, F-91128 Palaiseau, France
关键词:
electron heating;
PIC modelling;
capacivitely-coupled plasma;
tailored voltage waveforms;
ion flux asymmetry;
DISCHARGES;
ELECTRONS;
ARGON;
D O I:
10.1088/0963-0252/23/6/065010
中图分类号:
O35 [流体力学];
O53 [等离子体物理学];
学科分类号:
070204 ;
080103 ;
080704 ;
摘要:
Using particle-in-cell simulations, we predict that it is possible to obtain a significant difference between the ion flux to the powered electrode and that to the grounded electrode-with about 50% higher ion flux on one electrode-in a geometrically symmetric, radiofrequency capacitively-coupled plasma reactor by applying a non-sinusoidal, 'Tailored' voltage waveform. This sawtooth-like waveform presents different rising and falling slopes over one cycle. We show that this effect is due to differing plasma sheath motion in front of each electrode, which induces a higher ionization rate in front of the electrode which has the fastest positive rising voltage. Together with the higher ion flux comes a lower voltage drop across the sheath, and therefore a reduced maximum ion bombardment energy; a result in contrast to typical process control mechanisms.
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页数:9
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