Structural and optical properties of ZnO:Mg thin films grown under different oxygen partial pressures

被引:54
作者
Chen, Haixia [1 ]
Ding, Jijun [1 ]
Ma, Shuyi [1 ]
机构
[1] NW Normal Univ, Coll Phys & Elect Engn, Lanzhou 730070, Peoples R China
基金
中国国家自然科学基金;
关键词
ZnO:Mg thin films; RF magnetron sputtering; X-ray diffraction; Optical properties; PULSED-LASER DEPOSITION; PHOTOLUMINESCENCE; DEFECTS;
D O I
10.1016/j.physe.2009.12.005
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Pure and Mg-doped zinc oxide (ZnO:Mg) films were deposited using RF reactive magnetron sputtering at different oxygen partial pressures. The microstructures and optical properties in doped ZnO films were systematically investigated by X-ray diffraction (XRD), scanning electronic microscopy (SEM) and fluorescence spectrophotometer. The results indicated that ZnO grain orientation behavior was significantly affected by Mg-doping. And the ZnO:Mg film prepared at 15:10 had the best crystal quality among all ZnO:Mg films. The photoluminescence (PL) measurements at room temperature revealed a violet, two blue and a green emission. The origin of these emissions was discussed. It was also demonstrated that the optical band edge shifted to a shorter wavelength first as Mg was incorporated, and then to a longer wavelength with the increasing of oxygen partial pressures. Crown Copyright (C) 2009 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:1487 / 1491
页数:5
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