Effects of mold shape and sidewall roughness on nanoimprint by molecular dynamics simulation

被引：18

作者：

Yao, Chung Han ^{[1
]}

Chang, Chih Hang ^{[1
]}

Hsieh, Chih Wei ^{[2
]}

Sung, Cheng Kuo ^{[1
]}

机构：

[1] Natl Tsing Hua Univ, Dept Power Mech Engn, Hsinchu 30013, Taiwan

[2] Ind Technol Res Inst, Mech & Syst Res Labs, Hsinchu 310, Taiwan

来源：

MICROELECTRONIC ENGINEERING | 2010年 / 87卷 / 5-8期

关键词：

Direct nanoimprint; Molecular dynamics simulation; Imprinting factors; Mold shape; Sidewall roughness;

D O I：

10.1016/j.mee.2009.12.050

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper investigates the effects of mold shape and sidewall roughness on the formation of atomic-scale structure in a metal direct imprinting process by utilizing molecular dynamics (MD) simulation. Different types of tapered molds and different roughness are discussed in this study. The relationships between the imprinting force and the imprinting depth are acquired during the entire process. The simulation results show that with increasing taper angle theta, the imprinting force required is lower, and that different formation mechanisms can be identified. The geometries of the imprint patterns are affected by sidewall roughness. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：864 / 868

页数：5

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