Chemical Preparation of Graphene Materials Results in Extensive Unintentional Doping with Heteroatoms and Metals

被引:37
作者
Chua, Chun Kiang [1 ]
Ambrosi, Adriano [1 ]
Sofer, Zdenek [2 ]
Mackova, Anna [3 ,4 ]
Havranek, Vladimir [3 ]
Tomandl, Ivo [3 ]
Pumera, Martin [1 ]
机构
[1] Nanyang Technol Univ, Sch Phys & Math Sci, Div Chem & Biol Chem, Singapore 637371, Singapore
[2] Inst Chem Technol, Dept Inorgan Chem, CR-16628 Prague 6, Czech Republic
[3] Acad Sci Czech Republ, Inst Nucl Phys, CZ-25068 Rez, Czech Republic
[4] Univ JE Purkyne, Dept Phys, Fac Sci, Usti Nad Labem 40096, Czech Republic
关键词
doping; graphene; heteroatoms; oxidation; synthetic methods; NITROGEN-DOPED GRAPHENE; GRAPHITE OXIDE; THERMAL EXFOLIATION; REDUCING AGENT; REDUCTION; PERFORMANCE; ELECTROCHEMISTRY; GENERATION; HYDRAZINE; BORON;
D O I
10.1002/chem.201404205
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Chemical synthesis of graphene relies on the usage of various chemical reagents. The initial synthesis step, in which graphite is oxidized to graphite oxide, is achieved by a combination of chemical oxidants and acids. A subsequent chemical reduction step eliminates/reduces most oxygen functionalities to yield graphene. We demonstrate here that these chemical treatments significantly contaminate graphene with heteroatoms/metals, depending on the procedures followed. Contaminations with heteroatoms (N, B, Cl, S) or metals (Mn, Al) were present at relatively high concentrations (up to 3 at%), with their chemical states dependent on the procedures. Such unintentional contaminations (unwanted doping) during chemical synthesis are rarely anticipated and reported, although the heteroatoms/ metals may alter the electronic and catalytic properties of graphene. In fact, the levels of unintentionally introduced contaminants on graphene are often higher than typical levels found on intentionally doped graphene. Our findings are important for scientists applying chemical methods to prepare graphene.
引用
收藏
页码:15760 / 15767
页数:8
相关论文
共 51 条
[11]  
Gao W, 2009, NAT CHEM, V1, P403, DOI [10.1038/NCHEM.281, 10.1038/nchem.281]
[12]   Hydrazine and Thermal Reduction of Graphene Oxide: Reaction Mechanisms, Product Structures, and Reaction Design [J].
Gao, Xingfa ;
Jang, Joonkyung ;
Nagase, Shigeru .
JOURNAL OF PHYSICAL CHEMISTRY C, 2010, 114 (02) :832-842
[13]   Generation of B-Doped Graphene Nanoplatelets Using a Solution Process and Their Supercapacitor Applications [J].
Han, Jongwoo ;
Zhang, Li Li ;
Lee, Seungjun ;
Oh, Junghoon ;
Lee, Kyoung-Seok ;
Potts, Jeffrey R. ;
Ji, Junyi ;
Zhao, Xin ;
Ruoff, Rodney S. ;
Park, Sungjin .
ACS NANO, 2013, 7 (01) :19-26
[14]   Analysis on graphite dioxide [J].
Hofmann, U ;
Konig, E .
ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1937, 234 (04) :311-336
[15]   Magnetic impurities in graphene [J].
Hu, F. M. ;
Ma, Tianxing ;
Lin, Hai-Qing ;
Gubernatis, J. E. .
PHYSICAL REVIEW B, 2011, 84 (07)
[16]   PREPARATION OF GRAPHITIC OXIDE [J].
HUMMERS, WS ;
OFFEMAN, RE .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1958, 80 (06) :1339-1339
[17]   Nitrogen-Doped Graphene for High-Performance Ultracapacitors and the Importance of Nitrogen-Doped Sites at Basal Planes [J].
Jeong, Hyung Mo ;
Lee, Jung Woo ;
Shin, Weon Ho ;
Choi, Yoon Jeong ;
Shin, Hyun Joon ;
Kang, Jeung Ku ;
Choi, Jang Wook .
NANO LETTERS, 2011, 11 (06) :2472-2477
[18]   Simple approach for high-contrast optical imaging and characterization of graphene-based sheets [J].
Jung, Inhwa ;
Pelton, Matthew ;
Piner, Richard ;
Dikin, Dmitriy A. ;
Stankovich, Sasha ;
Watcharotone, Supinda ;
Hausner, Martina ;
Ruoff, Rodney S. .
NANO LETTERS, 2007, 7 (12) :3569-3575
[19]   Halogenated Graphenes: Rapidly Growing Family of Graphene Derivatives [J].
Karlicky, Frantisek ;
Datta, Kasibhatta Kumara Ramanatha ;
Otyepka, Michal ;
Zboril, Radek .
ACS NANO, 2013, 7 (08) :6434-6464
[20]   Epoxide reduction with hydrazine on graphene: A first principles study [J].
Kim, Min Chan ;
Hwang, Gyeong S. ;
Ruoff, Rodney S. .
JOURNAL OF CHEMICAL PHYSICS, 2009, 131 (06)