Photopatternability of poly(vinylearbazole) bearing cinnamate pendants and its blends with a soluble poly(p-phenylene vinylene) derivative

被引:10
作者
Yu, Young-Jun
Lee, Seung-Hun
Choi, Dong Hoon
Jin, Jung-Il [1 ]
Tessler, Nir
机构
[1] Korea Univ, Dept Chem, Ctr Electro & Photo Respons Mol, Seoul 136701, South Korea
[2] Technion Israel Inst Technol, Dept Elect Engn, Ctr Microelect, IL-32000 Haifa, Israel
[3] Technion Israel Inst Technol, Dept Elect Engn, Nanoelect Ctr, IL-32000 Haifa, Israel
关键词
photopatterning; poly(vinylcarbazole); cinnamate; PPV; carbazole; 2 pi+2 pi cycloaddition;
D O I
10.1007/BF03218765
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Poly[(1-(9-carbazolyl)ethylene)-co-(3-cinnamoyloxyoctyl-9-carbazolyl)] ethylene (PVK-Cin) was prepared by tethering cinnamate pendants to a carbazole group via an octylene spacer. The photopatternability of the new PVK based-polymer was investigated using a photocrosslinking reaction under UV light illumination (A = 254 nm). Blends of the PVK-Cin and a soluble poly(phenylene vinylene) (CzEh-PPV) were employed to study the photocrosslinking behavior. Well resolved lithographic patterns were observed in these polymer systems. PVK-Cin produced a blue light emitting pattern both before and after the photocrosslinking reaction. The blends of PVK-Cin and CzEh-PPV also showed corresponding emissions at 398 and 525 (560) nm in the film state.
引用
收藏
页码:142 / 146
页数:5
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