Analysis of removal region in nanoscale metal film processed by ultrafast-pulse laser

被引：5

作者：

Chen, B. C. ^{[1
]}

Lee, Y. C. ^{[2
]}

Ho, C. Y. ^{[3
]}

Wen, M. Y. ^{[4
]}

Tsai, Y. H. ^{[3
]}

机构：

[1] Buddhist Dalin Tzu Chi Gen Hosp, Dept Chinese Med, Chiayi 622, Taiwan

[2] Natl Taitung Jr Coll, Dept Architecture, Taitung 950, Taiwan

[3] Hwa Hsia Univ Technol, Dept Mech Engn, New Taipei 235, Taiwan

[4] Cheng Shiu Univ, Dept Mech Engn, Kaohsiung 833, Taiwan

来源：

COMPUTATIONAL MATERIALS SCIENCE | 2016年 / 117卷

关键词：

Ultrafast-pulse laser; Micromachining; Nanoscale film; INDIUM TIN OXIDE; ALUMINUM NITRIDE; THIN-FILMS; ABLATION; MODEL; EXCITATION; DYNAMICS; NANO;

D O I：

10.1016/j.commatsci.2015.11.037

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The ultrafast-pulse laser can be employed for the micromachining of nanoscale optical and electronic devices due to hardly diffusive heat-induced zone in very short period. In order to effectively control the processing quality, the ultrafast-pulse laser with certain wavelength and absorptivity for material is preferred. The processing characteristics of nanoscale devices patterned by ultrafast-pulse laser are different from these of traditional large scale device and long pulse laser. The traditional model cannot correctly account for processing characteristics. Therefore, this study utilizes an improved electron kinetic theory to analyze the processing characteristics of the nanoscale metal film ablated by ultrafast-pulse laser. The ablated depth per pulse and crater diameter in nanoscale metal film are predicted by this work and compared with the available measured data. This study theoretically validates that the first regime is determined by directly optical penetration absorption for low laser fluences and the second regime is governed by the thermal diffusion for high laser fluences. The effects of material properties on the ablation rate and squared diameter are also discussed. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：590 / 595

页数：6

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