Self-assembly of photoresponsive [2.2]Paracyclophane-Derivative manostripes on a conducting surface with modified wettability

The self-organization and patterning of the paracyclophane-derivative (PCP1) nanostripes were generated through a multiple-step thin-film technology based on CF4 plasma treatment of an fluorine-doped tin oxide (FTO). The employment of CF4 plasma treatment resulted in a change of the wetting behavior in a desirable way with the formation of the rodlike structure that is evident in the FTO irradiated region. The presence of few rods outside the irradiated region was due to the fact that the masks were mechanically positioned onto the FTO surface, allowing the plasma to reach some spots below the grid bars. The SEM images showed that the different values could be attributed to the ordered, high-density structure in which the PCP derivatives were tightly packed. Results show that the photoresponse for the rodlike morphology is much larger than that of the PCP1 bulk compound.