Structural, optical and electrochromic properties of Nb2O5:MoO3 (95:5, 90:10, and 85:15) thin films prepared by RF magnetron sputtering technique

被引：16

作者：

Usha, N. ^{[1
]}

Sivakumar, R. ^{[2
]}

Sanjeeviraja, C. ^{[3
]}

机构：

[1] Jubail Univ Coll, Dept Gen Studies, Al Jubail 35716, Saudi Arabia

[2] Alagappa Univ, Dept Phys, Karaikkudi 630003, Tamil Nadu, India

[3] Alagappa Chettiar Coll Engn & Technol, Dept Phys, Karaikkudi 630003, Tamil Nadu, India

来源：

MATERIALS LETTERS | 2018年 / 229卷

关键词：

Thin films; Sputtering; Amorphous materials; Structural; Electrochromic property;

D O I：

10.1016/j.matlet.2018.07.019

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report the structural, optical and electrochromic properties of mixed Nb2O5:MoO3 (95:5, 90:10, and 85:15) thin films prepared by RF magnetron sputtering technique on fluorine doped tin oxide coated glass substrate. X-ray diffraction analysis reveals the amorphous nature of films. From the optical measurement, a blue shift of energy band gap was observed for Nb2O5:MoO3 films with increasing MoO(3 )concentration. The electrochromic study showed that all the films have good coloration-bleaching kinetics. The maximum coloration efficiency of 2.303 mm(2)/C was obtained for the Nb2O5:MoO3 (85:15) film. (C) 2018 Elsevier B.V. All rights reserved.

引用

页码：189 / 192

页数：4

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