Measured optical constants of copper from 10 nm to 35 nm

被引:19
作者
Brimhall, Nicole [1 ]
Herrick, Nicholas [1 ]
Allred, David D. [1 ]
Turley, R. Steven [1 ]
Ware, Michael [1 ]
Peatross, Justin [1 ]
机构
[1] Brigham Young Univ, Dept Phys & Astron, Provo, UT 84602 USA
基金
美国国家科学基金会;
关键词
DIELECTRIC-CONSTANT; GOLD; CU;
D O I
10.1364/OE.17.023873
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We use laser high-order harmonics and a polarization-ratio-reflectance technique to determine the optical constants of copper and oxidized copper in the wavelength range 10-35 nm. This measurement resolves previously conflicting data sets, where disagreement on optical constants of copper in the extreme ultraviolet most likely arises from inadvertent oxidation of samples before measurement. (C) 2009 Optical Society of America
引用
收藏
页码:23873 / 23879
页数:7
相关论文
共 17 条
[1]  
ATTWOOD D, 2004, J PHYS D, V37, P3233
[2]   DIELECTRIC-CONSTANT OF GOLD, COPPER, AND GOLD-COPPER ALLOYS BETWEEN 18 AND 35 EV [J].
BEAGLEHOLE, D ;
DECRESCENZI, M ;
THEYE, ML ;
VUYE, G .
PHYSICAL REVIEW B, 1979, 19 (12) :6303-6314
[3]   Polarization-ratio reflectance measurements in the extreme ultraviolet [J].
Brimhall, N. ;
Heilmann, N. ;
Ware, M. ;
Peatross, J. .
OPTICS LETTERS, 2009, 34 (09) :1429-1431
[4]   Extreme-ultraviolet polarimeter utilizing laser-generated high-order harmonics [J].
Brimhall, Nicole ;
Turner, Matthew ;
Herrick, Nicholas ;
Allred, David D. ;
Turley, R. Steven ;
Ware, Michael ;
Peatross, Justin .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2008, 79 (10)
[5]   Electrochemical materials and processes in Si integrated circuit technology [J].
Dubin, V. M. ;
Akolkar, R. ;
Cheng, C. C. ;
Chebiam, R. ;
Fajardo, A. ;
Gstrein, F. .
ELECTROCHIMICA ACTA, 2007, 52 (08) :2891-2897
[6]   AFM characterization of copper dendritic growths in integrated electronic microcircuits [J].
Gabrielli, C. ;
Mace, C. ;
Ostermann, E. ;
Pailleret, A. .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2008, 11 (01) :D5-D8
[7]   Formation of a copper oxide layer as a key step in the metallic copper deposition mechanism [J].
Gimenez-Romero, David ;
Garcia-Jareno, Jose Juan ;
Agrisuelas, Jeronimo ;
Gabrielli, Claude ;
Perrot, Hubert ;
Vicente, Francisco .
JOURNAL OF PHYSICAL CHEMISTRY C, 2008, 112 (11) :4275-4280
[8]   Integration and characterization of gas cluster processing for copper interconnects electromigration improvement [J].
Gras, R. ;
Gosset, L. G. ;
Petitprez, E. ;
Girault, V. ;
Hopstaken, M. ;
Jullian, S. ;
Imbert, G. ;
Le Friec, Y. ;
Bienacel, J. ;
Guillan, J. ;
Chevolleau, T. ;
Sherman, S. ;
Tabat, M. ;
Hautala, J. ;
Torres, J. .
MICROELECTRONIC ENGINEERING, 2007, 84 (11) :2675-2680
[9]   ABSORPTION MEASUREMENTS OF COPPER SILVER TIN GOLD AND BISMUTH IN FAR ULTRAVIOLET [J].
HAENSEL, R ;
KUNZ, C ;
SASAKI, T ;
SONNTAG, B .
APPLIED OPTICS, 1968, 7 (02) :301-&
[10]  
HAGEMANN HJ, 1975, J OPT SOC AM, V65, P742, DOI 10.1364/JOSA.65.000742