Imprinted optical device and its reliability

被引:7
作者
Ryu, Jin-Hwa [1 ]
Lee, Tae-Ho [1 ]
Oh, Seung-Hun [1 ]
Cho, Sang-Uk [1 ]
Kim, Chang-Seok [1 ]
Jeong, Myung-Yung [1 ]
机构
[1] Pusan Natl Univ, Coll Nanosci & Nanotechnol, Miryang 627706, South Korea
关键词
Nano-imprint lithography; Reliability; Polymeric optical device; INTEGRATED REFLECTOR MIRRORS; POLYMER WAVE-GUIDE; NANOIMPRINT LITHOGRAPHY; THERMAL NANOIMPRINT; EVOLUTION;
D O I
10.1016/j.cap.2008.12.022
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Although imprint technology has made considerable progress in recent times, there are certain limitations on its use because of several problems. One of these is the reliability caused by the dimensional change of the imprinted structure. In particular, a hot-embossed structure is inherently involved in residual stress due to the temperature and pressure cycle during the fabrication process. A structure with residual stress undergoes stress relaxation, which leads to dimensional change. Therefore, we have conducted research on its dimensional stability by using an annealing process. To evaluate the reliability of an imprinted structure, it is necessary to measure changes in the mechanical properties, such as elastic modulus, micro-hardness, residual stress, and dimensional change. Through these measurements, we propose a way of controlling the level of residual stress. Before annealing, the dimension of an imprinted structure changes by 0.9 mu m during one month. However, after annealing, a dimensional change of 0.3 mu m was observed over the same period. (C) 2009 Elsevier B. V. All rights reserved.
引用
收藏
页码:E7 / E11
页数:5
相关论文
共 9 条
[1]   Annealing effect on microhardness and elastic constants of PMMA [J].
Afifi, H ;
Hasan, E .
POLYMER-PLASTICS TECHNOLOGY AND ENGINEERING, 2003, 42 (04) :543-554
[2]   Polymer waveguide with integrated reflector mirrors for an inter-chip link system [J].
Cho, In-Kui ;
Lee, Woo-Jin ;
Rho, Byung-Sup ;
Jeong, Myung-Yung .
OPTICS COMMUNICATIONS, 2008, 281 (19) :4906-4909
[3]   Optical module using polymer waveguide with integrated reflector mirrors [J].
Cho, In-Kui ;
Lee, Woo-Jin ;
Jeong, Myung-Yung ;
Park, Hyo-Hoon .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2008, 20 (5-8) :410-412
[4]   Nanoimprint lithography [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4129-4133
[5]   Polymer viscoelasticity and residual stress effects on nanoimprint lithography [J].
Ding, Yifu ;
Ro, Hyun Wook ;
Douglas, Jack F. ;
Jones, Ronald L. ;
Hine, Daniel R. ;
Karim, Alamgir ;
Soles, Christopher L. .
ADVANCED MATERIALS, 2007, 19 (10) :1377-+
[6]   Real-time shape evolution of nanoimprinted polymer structures during thermal annealing [J].
Jones, Ronald L. ;
Hu, Tengjiao ;
Soles, Christopher L. ;
Lin, Eric K. ;
Reano, Ronald M. ;
Casa, Diego M. .
NANO LETTERS, 2006, 6 (08) :1723-1728
[7]   Improvements of defects by patterning using thermal nanoimprint lithography [J].
Park, Hyung Seok ;
Shin, Ho Hyun ;
Sung, Man Young ;
Choi, Woo Beom ;
Choi, Seung Woo ;
Park, Sang Yong .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4A) :1808-1814
[8]   Profile evolution during thermal nanoimprint [J].
Scheer, HC ;
Bogdanski, N ;
Wissen, M ;
Konishi, T ;
Hirai, Y .
MICROELECTRONIC ENGINEERING, 2006, 83 (4-9) :843-846
[9]   OPTICAL MULTIMODE INTERFERENCE DEVICES BASED ON SELF-IMAGING - PRINCIPLES AND APPLICATIONS [J].
SOLDANO, LB ;
PENNINGS, ECM .
JOURNAL OF LIGHTWAVE TECHNOLOGY, 1995, 13 (04) :615-627