Optimization of planar Hall resistance using biaxial currents in a NiO/NiFe bilayer: Enhancement of magnetic field sensitivity

被引:18
作者
Kim, DY [1 ]
Park, BS
Kim, CG
机构
[1] Hyundai Elect Ind Co Ltd, Telecommun Syst Lab 2, Kyonggi 476860, South Korea
[2] Sun Moon Univ, Dept Phys, Chungnam 336840, South Korea
关键词
D O I
10.1063/1.1289077
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present the optimized planar Hall resistance (PHR) obtained by using biaxial currents in a NiO (30 nm)/NiFe (30 nm) bilayers. The measured PHR, R-xy, had a drift resistance due to the intrinsic and extrinsic characteristics caused by magnetization and sample geometry, respectively. The drift voltage due to drift resistance restricted the PHR ratio and could be compensated for by using the auxiliary current I-x for the sensing current I-y to enhance PHR ratio. A huge PHR ratio over 3000% (+/- 1500%) with the linearity and small hysteresis for the magnetic field experimentally obtained using biaxial currents and could be explained by the anisotropic characteristic of the magnetoresistance, which is influenced by the exchange coupling field (H-ex) induced by the antiferromagnetic NiO layer. (C) 2000 American Institute of Physics. [S0021-8979(00)02219-2].
引用
收藏
页码:3490 / 3494
页数:5
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