Diagnostics of inductively coupled chlorine plasmas:: Measurement of Cl2 and Cl number densities

被引:91
作者
Malyshev, MV [1 ]
Donnelly, VM [1 ]
机构
[1] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
关键词
D O I
10.1063/1.1321777
中图分类号
O59 [应用物理学];
学科分类号
摘要
This article presents measurements of absolute Cl-2 and CI number densities in a chlorine transformer-coupled plasma. It is part of a series of reports on measurements of densities and energy distributions of all charged and neutral species in the same plasma system over an extensive range of pressure and power. Cl-2 and Cl number densities were determined from optical emission spectroscopy and advanced actinometry. Number densities relative to the Xe actinometry gas are reported as a function of pressure (1-20 mTorr) and power (10-1000 W) during slow etching of SiO2-covered Si wafers. A detailed treatment of the effects of gas temperature on the conversion of these ratios into absolute number densities is also included. Cl-2 is largely (similar to 90%) dissociated at the highest powers, with a somewhat higher degree of dissociation at low pressure. The Cl number density becomes nearly independent of power at high powers (I:specially at lower pressure) due to the combination of a higher degree of dissociation of Cl-2 and an overall drop in number density due to heating of the gas. A zero-dimensional (global) model is used to compute Cl-2 and Cl number densities. It gives a Cl wall recombination coefficient of 0.04 on the plasma-seasoned stainless steel walls. (C) 2000 American Institute of Physics. [S0021-8979(00)07523-X].
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页码:6207 / 6215
页数:9
相关论文
共 33 条
[1]   Spatially averaged (global) model of time modulated high density chlorine plasmas [J].
Ashida, S ;
Lieberman, MA .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (02) :854-861
[2]   Two-dimensional fluid model of an inductively coupled plasma with comparison to experimental spatial profiles [J].
Bukowski, JD ;
Graves, DB ;
Vitello, P .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (05) :2614-2623
[3]   OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY [J].
COBURN, JW ;
CHEN, M .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) :3134-3136
[4]   Trace rare gases optical emission spectroscopy for determination of electron temperatures and species concentrations in chlorine-containing plasmas [J].
Donnelly, VM ;
Malyshev, MV ;
Kornblit, A ;
Ciampa, NA ;
Colonell, JI ;
Lee, JTC .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (4B) :2388-2393
[5]   Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature [J].
Donnelly, VM ;
Malyshev, MV .
APPLIED PHYSICS LETTERS, 2000, 77 (16) :2467-2469
[6]   A simple optical emission method for measuring percent dissociations of feed gases in plasmas: Application to Cl-2 in a high-density helical resonator plasma [J].
Donnelly, VM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1996, 14 (03) :1076-1087
[7]   Mass spectrometric measurements of neutral reactant and product densities during Si etching in a high-density helical resonator Cl-2 plasma [J].
Donnelly, VM .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (12) :9353-9360
[8]   Measurement of the cross sections for electron-impact excitation into the 5p56p levels of xenon [J].
Fons, JT ;
Lin, CC .
PHYSICAL REVIEW A, 1998, 58 (06) :4603-4615
[9]  
FORRISTER RM, 1995, B AM PHYS SOC, V40, P1556
[10]   Relative atomic chlorine density in inductively coupled chlorine plasmas [J].
Hebner, GA .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (02) :578-581