Low-frequency noise characteristics of InGaAs quantum-dot infrared photodetector structures grown by atomic layer molecular-beam epitaxy

被引:6
作者
Choi, WJ
Song, JD
Hwang, SH
Lee, JI [1 ]
Kim, JH
Song, JI
Kim, EK
Chovet, A
机构
[1] Korea Inst Sci & Technol, Nano Device Res Ctr, Seoul 136791, South Korea
[2] K JIST, Dept Informat & Commun, Kwangju 506303, South Korea
[3] Hanyang Univ, Dept Phys, Seoul 133791, South Korea
[4] INPG, CNRS, ENSERG, IMEP, F-38016 Grenoble, France
关键词
InGaAs; GaAs; quantum dots; QDIP; low-frequency noise; Hooge parameter;
D O I
10.1016/j.physe.2004.08.010
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Optical and electrical characteristics of n-i-n InGaAs/GaAs quantum-dot (QD) infrared photodetectors are reported. In particular, the low-frequency excess electrical noise is measured at room temperature and analyzed in conjunction with the optical properties of the structure. The three stackings of QD were formed by atomic layer molecular-beam epitaxy and highly Si-doped, and AlGaAs current-blocking layer was also included to reduce the dark current. The power-dependent photo luminescence (PL) spectra at 300 K indicates that there are at least three confined states in the QD. The photo-current was observed only at low temperatures (10 K) at wavelengths between 3 and 9 mum with three peaks. The dark current was relatively large and asymmetric at low temperatures. At room temperature the dark current was symmetric and ohmic. The 1/f-like low-frequency noise spectral density exhibited an almost quadratic current dependence giving a large value of the Hooge parameter of the order of unity. The relatively low-growth temperature for the AlGaAs current blocking layer and the high doping at the quantum dots seem to generate a considerable amount of defects and result in low-temperature photodetection and a large low-frequency noise density. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:366 / 371
页数:6
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