Evidence of covalent bond formation at the silane-metal interface during plasma polymerization of bis-1,2-(triethoxysilyl)ethane (BTSE) on aluminium

被引:23
作者
Batan, A. [1 ,2 ]
Mine, N. [2 ]
Douhard, B. [2 ]
Brusciotti, F. [3 ]
De Graeve, I. [3 ]
Vereecken, J. [3 ]
Wenkin, M. [4 ]
Piens, M. [4 ]
Terryn, H. [3 ]
Pireaux, J. J. [2 ]
Reniers, F. [1 ]
机构
[1] Univ Libre Bruxelles, B-1050 Brussels, Belgium
[2] Univ Namur FUNDP, Res Ctr Phys Matter & Radiat PMR, B-5000 Namur, Belgium
[3] Vrije Univ Brussel, Res Grp Electrochem & Surface Engn SURF, Brussels, Belgium
[4] Coating Res Inst CoRI, Limelette, Belgium
关键词
Plasma polymer films; Silane; ToF-SIMS; BTSE; XPS; TOF-SIMS; GAMMA-GLYCIDOXYPROPYLTRIMETHOXYSILANE; FILMS; DEPOSITION;
D O I
10.1016/j.cplett.2010.05.002
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Silane and silane-like films were deposited from bis-1,2-(triethoxysilyl) ethane by vacuum and atmospheric plasma onto aluminium. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was used for probing the aluminium/plasma polymer film interface. An AlOSi+ fragment was identified at nominal mass m/z = 70.9539 amu, indicating a strong chemical interaction (formation of a covalent bond) at the substrate/film interface. Until now, this strong silane-aluminium interaction has never been observed in plasma polymer BTSE films. Ageing tests in an ultrasonic water bath combined with X-ray photoelectron spectroscopy measurements allowed to indirectly confirm good adhesion, and therefore the formation of a chemical bond at the interface. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:107 / 112
页数:6
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