Through-Silicon Hole Interposers for 3-D IC Integration

被引:36
作者
Lau, John H. [1 ]
Lee, Ching-Kuan [1 ]
Zhan, Chau-Jie [1 ]
Wu, Sheng-Tsai [1 ]
Chao, Yu-Lin [1 ]
Dai, Ming-Ji [1 ]
Tain, Ra-Min [1 ]
Chien, Heng-Chieh [1 ]
Hung, Jui-Feng [1 ]
Chien, Chun-Hsien [1 ]
Cheng, Ren-Shing [1 ]
Huang, Yu-Wei [1 ]
Cheng, Yu-Mei [1 ]
Liao, Li-Ling [1 ]
Lo, Wei-Chung [1 ]
Kao, Ming-Jer [1 ]
机构
[1] Ind Technol Res Inst, Elect & Optoelect Res Lab, Hsinchu 31040, Taiwan
来源
IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY | 2014年 / 4卷 / 09期
关键词
2.5D/3D IC integration; interposer; re-distribution layer; through-silicon hole; through-silicon via;
D O I
10.1109/TCPMT.2014.2339832
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this investigation, a system-in-package (SiP) that consists of a very low-cost interposer with through-silicon holes (TSHs) and with chips on its top and bottom sides (a real 3-D IC integration) is studied. Emphasis is placed on the fabrication of a test vehicle to demonstrate the feasibility of this SiP technology. The design, materials, and process of the top chip, bottom chip, TSH interposer, and final assembly will be presented. Shock and thermal cycling tests will be performed to demonstrate the integrity of the SiP structure.
引用
收藏
页码:1407 / 1419
页数:13
相关论文
共 25 条
  • [1] [Anonymous], 2013, PROC INT S MICROELEC
  • [2] Banijamali B, 2013, 2013 IEEE 63RD ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), P35, DOI 10.1109/ECTC.2013.6575547
  • [3] Banijamali B, 2012, 2012 IEEE 62ND ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), P309, DOI 10.1109/ECTC.2012.6248847
  • [4] Banijamali B, 2011, ELEC COMP C, P285, DOI 10.1109/ECTC.2011.5898527
  • [5] Chaware R, 2012, 2012 IEEE 62ND ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), P279, DOI 10.1109/ECTC.2012.6248841
  • [6] Chien H. C., 2012, P IEEE ICEP APR, P38
  • [7] Chien HC, 2012, 2012 IEEE 62ND ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), P1866, DOI 10.1109/ECTC.2012.6249092
  • [8] Chuang YL, 2013, 2013 IEEE 63RD ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC), P852, DOI 10.1109/ECTC.2013.6575673
  • [9] Hung J. F., 2012, PROC 45 IMAPS INT S, P1221
  • [10] JEDEC Standard, 2016, JESD22-B111A