Maskless photolithography via holographic optical projection

被引：26

作者：

Bay, Christoph ^{[1
]}

Huebner, Nils ^{[2
]}

Freeman, Jon ^{[1
]}

Wilkinson, Tim ^{[1
]}

机构：

[1] Univ Cambridge, Ctr Mol Mat Photon & Elect, Dept Engn, Cambridge CB3 0FA, England

[2] Hsch Pforzheim, Fak Tech, Bereich Informat Tech, D-75175 Pforzheim, Germany

来源：

OPTICS LETTERS | 2010年 / 35卷 / 13期

关键词：

PHASE; LITHOGRAPHY; ALGORITHM; DESIGN; SLM;

D O I：

10.1364/OL.35.002230

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We propose an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features. (C) 2010 Optical Society of America

引用

页码：2230 / 2232

页数：3

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