Physical and chemical implications of 100 keV H+ implantation of laser ablated PPS thin films

被引:8
|
作者
Das, A
Bera, S
Dhara, S
Patnaik, A [1 ]
机构
[1] Indian Inst Technol, Dept Chem, Madras 600036, Tamil Nadu, India
[2] Indira Gandhi Ctr Atom Res, Div Mat Sci, Kalpakkam 603102, Tamil Nadu, India
[3] Indira Gandhi Ctr Atom Res, Water & Steam Chem Lab, Kalpakkam 603102, Tamil Nadu, India
关键词
polymer; laser ablation; proton implantation; X-ray Photoelectron Spectroscopy;
D O I
10.1016/S0168-583X(97)00728-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Structural and chemical investigation for the laser ablated Poly (Phenylene Sulfide) (PPS) films upon 100 keV H+ implantation is reported here for the first time. PPS thin films were fabricated by laser ablation with a Nd:YAG laser as a source of visible photons (532 nm). The laser ablated thin films showed strong polymer breakdown resistance upto a total fluence of 10(15) ions/cm(2). Bulk properties of the as-deposited and the implanted samples were investigated using FTIR and UV-VIS spectroscopy. Drastic reduction in the intensity of all characteristic vibrational frequencies in the FTIR spectrum at higher doses revealed the transformation of the polymer to a conjugated carbonaceous material. UV-VIS studies showed a positive shift in the absorption edge value for the as-deposited polymer towards higher wavelengths and destruction of phenyl ring due to the H+ bombardment. X-ray Photoelectron Spectroscopic (:XPS) investigation indicated the sulfur depletion as a prominent phenomenon whereas carbon content remained almost the same. XPS studies of the implanted sample also revealed a minor change in the oxidized species of carbon and more prominent change in oxidized species of sulfur which were present in the as-deposited samples. A peak at 283.4 eV attributed to 'surface reconstruction' in the XPS analysis for the as-deposited PPS film disappeared after proton implantation. (C) 1998 Elsevier Science B.V.
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页码:377 / 384
页数:8
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