Recent advances on physico-chemical characterization of passive films by EIS and differential admittance techniques

被引:9
作者
Di Quarto, F. [1 ]
La Mantia, F. [1 ]
Santamaria, M. [1 ]
机构
[1] Univ Palermo, Dipartimento Ingn Chim Proc & Mat, I-90128 Palermo, Italy
关键词
passive film; a-SC schottky barrier; EIS spectra;
D O I
10.1016/j.corsci.2006.05.019
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin Nb2O5 anodic films (similar to 20 nm thick) grown in phosphoric acid solution have been characterised by EIS and differential admittance study in a large range of potential and frequency. The overall electrical behaviour has been interpreted by means of the theory of amorphous semiconductor Schottky barrier in presence of a non-constant density of states (DOS). A comparison of DOS for films grown in different electrolytes is reported. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:186 / 194
页数:9
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