Narrowband laser produced extreme ultraviolet sources adapted to silicon/molybdenum multilayer optics

被引：22

作者：

Schriever, G ^{[1
]}

Bergmann, K ^{[1
]}

Lebert, R ^{[1
]}

机构：

[1] Rhein Westfal TH Aachen, Lehrstuhl Lasertech, D-52074 Aachen, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 1998年 / 83卷 / 09期

关键词：

D O I：

10.1063/1.367238

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The extreme ultraviolet radiation emitted from a plasma generated by a pulsed Nd:yttrium aluminum garnet laser is investigated around 13 nm wavelength for several low Z elements (lithium, nitrogen, oxygen, fluorine). A narrowband EUV source can be designed by using the narrowband line emission of low Z elements in combination with the broadband reflection characteristic of silicon/molybdenum (Si/Mo) multilayer mirrors. Experimental results are discussed within a theoretical model, which allows a deduction of an optimization criterion for a maximum conversion efficiency. The Lyman-a line of hydrogenlike lithium ions fulfills the demands for high intense, free-standing narrowband emission at the long wavelength side of the silicon absorption L edge. (C) 1998 American Institute of Physics.

引用

页码：4566 / 4571

页数：6

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