In situ and ex situ characterization of thin films by soft X-ray emission spectroscopy

被引：20

作者：

Guo, JH

Skytt, P

Wassdahl, N

Nordgren, J

机构：

[1] Univ Uppsala, Dept Phys, S-75121 Uppsala, Sweden

[2] ABB Corp Res, Avd D, S-72178 Vasteras, Sweden

[3] ITE, S-83125 Ostersund, Sweden

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2000年 / 110卷 / 1-3期

关键词：

D O I：

10.1016/S0368-2048(00)00156-0

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Soft X-ray emission spectroscopy has been used as a chemical probe in the characterization of thin film materials. Some examples of soft X-ray emission studies are presented to show the chemical sensitivity, site selectivity and depth dependence of this method. The substantial penetration of soft X-rays offers true bulk probing and facilitates studies of interfaces and buried structures. By choosing the proper geometry soft X-ray emission spectroscopy provides a non-destructive chemical analysis of sandwich structures. This technique has also been used to enable in situ and real-time characterization of thin films during vapor deposition growth. (C) 2000 Elsevier Science BN. All rights reserved.

引用

页码：41 / 67

页数：27

共 83 条

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