CO interaction with co-adsorbed C2H4 on Cu(111) as revealed by friction with the conduction electrons

被引:26
作者
Hein, M
Dumas, P
Otto, A [1 ]
Williams, GP
机构
[1] Univ Dusseldorf, IPkM, Lehrstuhl Oberflachenwissensch, D-40225 Dusseldorf, Germany
[2] Ctr Univ Paris Sud, LURE, F-91405 Orsay, France
[3] Ctr Univ Paris Sud, CNRS, LASIR, F-91405 Orsay, France
[4] Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
关键词
adsorption kinetics; alkenes; carbon monoxide; copper; friction; infrared absorption spectroscopy; metallic films; reflection spectroscopy; surface electrical transport (surface conductivity; surface recombination; etc.);
D O I
10.1016/S0039-6028(00)00681-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Simultaneous measurements of the DC resistance and IR reflectivity changes of thin epitaxially grown copper (111) films have been performed during co-adsorption of CO with C2H4. The linear dependence of these two quantities, which has previously been observed for CO on Cu(lll) films, also holds for this coadsorbed system. Importantly, we have shown that the linearity factor is independent of the adsorbate type, as predicted by the scattering model of the conduction electrons. Co-adsorption of CO with C2H4 results in markedly more pronounced changes in IR reflectance and in resistance; these changes are higher than the sum of the individual changes of each species. The results are interpreted as a consequence of covalent through-metal bonding of the adsorbates via the lowest unoccupied molecular orbitals, (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:249 / 258
页数:10
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