Study on the variations of microstructures and domain structures of Bo3.35La0.85Ti3O12 ferroelectric thin films formed by two-step rapid thermal annealing (RTA) process utilizing piezoresponse force microscope (PFM)

被引:1
作者
Choi, S
Hong, SK
Oh, SH
Lee, KN
Chung, I
机构
[1] Sungkyunkwan Univ, Sch Informat & Commun Engn, Jangan Ku, Suwon, South Korea
[2] Hynix Semicond Inc, Memory R&D Div, Ichon 467701, Kyoungki Do, South Korea
关键词
ferroelectric; La-substituted bismuth titanate (BLT); thin film; two step; RTA; Piezoresponse force microscope (PFM); X-ray diffraction (XRD); crystalline; orientation;
D O I
10.1080/10584580490896427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recently, La-substituted Bi4Ti3O12 (BLT) has been widely studied as a candidate material for FeRAM due to its superior properties like high fatigue endurance with relatively lower crystallization temperature. In this study, we attempted to examine ferroelectric properties of various BLT thin films that were made using two-step rapid thermal annealing (RTA) process. The microstructure of BLT thin film is appeared as a critical factor to maximize ferroelectric properties. We found that the 2nd annealing temperature in two-step RTA process played an important role in determining the crystalline orientation of BLT thin films. Grain orientations of the BLT thin films were interpreted based on x-ray diffraction (XRD) in conjunction with piezoresponse images that were obtained utilizing piezoresponse force microscope (PFM). In addition, the results were correlated with the hysteresis loops.
引用
收藏
页码:189 / 198
页数:10
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