Giant magnetoimpedance effect in sputtered single layered NiFe film and meander NiFe/Cu/NiFe film

被引:20
作者
Chen, L. [1 ]
Zhou, Y. [1 ]
Lei, C. [1 ]
Zhou, Z. M. [1 ]
Ding, W. [1 ]
机构
[1] Shanghai Jiao Tong Univ, Natl Key Lab Nano Micro Fabricat Technol, Key Lab Thin Film & Microfabricat, Inst Micro & Nano Sci & Technol,Minist Educ, Shanghai 200240, Peoples R China
关键词
Giant magnetoimpedance; NiFe thin film; Meander structure; Size effect; MAGNETO-IMPEDANCE; RIBBONS;
D O I
10.1016/j.jmmm.2010.04.038
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Giant magnetoimpedance (GMI) effect on NiFe thin film is very promising due to its application in developing the magnetic field sensors with highly sensitivity and low cost. In this paper, the single layered NiFe thin film and NiFe/Cu/NiFe thin film with a meander structure are prepared by the MEMS technology. The influences of sputtering parameters, film structure and conductor layer width on GMI effect in NiFe single layer and meander NiFe/Cu/NiFe film are investigated. Maximum of the GMI ratio in single layer and sandwich film is 5% and 64%, respectively. The results obtained are useful for developing the high-performance magnetic sensors based on NiFe thin film. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:2834 / 2839
页数:6
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