Simulation of surfactant effects on the growth of metal homoexpitaxial Sb-Ag/Ag(111)

被引：1

作者：

Wu Li-Li ^{[1
]}

Wu Feng-Min ^{[1
]}

机构：

[1] Zhejiang Normal Univ, Coll Math & Phys, Jinhua 321004, Peoples R China

来源：

CHINESE PHYSICS B | 2010年 / 19卷 / 06期

关键词：

surfactant; repulsive; exchange; Monte Carlo simulation; BY-LAYER GROWTH; HOMOEPITAXIAL GROWTH; EPITAXIAL-GROWTH;

D O I：

10.1088/1674-1056/19/6/066801

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A kinetic Monte Carlo simulation is performed in order to study the effect of Sb atoms as a surfactant on the growth of Ag on Ag(111). In our model the repulsive mechanism in which the surfactant Sb atoms repel diffusing Ag adatoms, and the exchange mechanism between Ag and Sb atoms, are considered. Our simulations show that the effects of Sb atoms for Ag/Ag(111) growth system are mainly to increase the chances for Ag atoms to overcome the Ehrlich-Schwoebel barrier both in the interlayer growth and along the edge diffusion. The influence of the coverage of Sb atoms and substrate temperature on the growth of Ag/Sb/Ag(111) is discussed.

引用

页数：6

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