A high performance 0.25 mu m logic technology optimized for 1.8V operation

被引:52
作者
Bohr, M
Ahmed, SS
Ahmed, SU
Bost, M
Ghani, T
Greason, J
Hainsey, R
Jan, C
Packan, P
Sivakumar, S
Thompson, S
Tsai, J
Yang, S
机构
来源
IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996 | 1996年
关键词
D O I
10.1109/IEDM.1996.554112
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A 0.25 mu m generation logic technology has been developed with high performance transistors and five layers of planarized interconnect. The transistors are optimized for 1.8V operation to provide high performance, low power and good reliability. The interconnects feature extensive use of planarization and high aspect ratio metal lines. 4 Mbit SRAMs with a 10.26 mu m(2) 6-T cell size have been built on this technology.
引用
收藏
页码:847 / 850
页数:4
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