cubic boron nitride;
Auger electron spectroscopy;
infrared spectroscopy;
Raman spectroscopy;
reactive ion assisted deposition;
D O I:
10.1016/S0040-6090(97)00380-5
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The attainment of cubic boron nitride by physical vapour deposition methods is influenced by several parameters. We present new results obtained at about 343 K on the system boron-nitrogen with an RF sputtering machine, adopting both DC and RF bias and in argon or argon plus nitrogen atmospheres. We also prepared samples by reactive ion assisted deposition (LEAD). The films were deposited on silicon substrates, and characterized by Auger electron spectroscopy (AES) infrared (IR) and Raman spectroscopies and nanoindentation. Significant differences are found between DC and RF biased samples, in particular concerning film structure. Evidence of sp(3) bonded phase formation, as given by IR spectroscopy, is found only in samples produced with a RF bias. Raman spectra of all films show a broad band typical of a completely disordered structure. Strong Raman signals from the substrate prove that the films, except the IBAD ones, are highly transparent in the visible. (C) 1997 Elsevier Science S.A.
机构:
IBM Corp, Div Gen Prod, San Jose, CA 95193 USA
Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAIBM Corp, Div Gen Prod, San Jose, CA 95193 USA
Doerner, M. F.
Nix, W. D.
论文数: 0引用数: 0
h-index: 0
机构:
Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAIBM Corp, Div Gen Prod, San Jose, CA 95193 USA
机构:
IBM Corp, Div Gen Prod, San Jose, CA 95193 USA
Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAIBM Corp, Div Gen Prod, San Jose, CA 95193 USA
Doerner, M. F.
Nix, W. D.
论文数: 0引用数: 0
h-index: 0
机构:
Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAIBM Corp, Div Gen Prod, San Jose, CA 95193 USA