UV assisted pyrolysis of solution deposited BiFeO3 multiferroic thin films. : Effects on microstructure and functional properties

被引:21
作者
Habouti, S. [1 ]
Solterbeck, C.-H. [1 ]
Es-Souni, M. [1 ]
机构
[1] Kiel Univ Appl Sci, IMST, D-24149 Kiel, Germany
关键词
multiferroic; BiFeO3; dielectric properties; ferroelectric properties; leakage current; magnetic properties;
D O I
10.1007/s10971-006-0201-y
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
BiFeO3 thin films were processed on platinized silicon substrate via chemical solution deposition. Short wave UV assisted pyrolysis was conducted in oxygen atmosphere in order to obtain a fine and homogeneous grain structure. Phase pure thin films with a pronounced (100) texture were obtained at a fairly low annealing temperature of 600 degrees C. For comparison specimens processed without UV assisted pyrolysis were also investigated. It is shown that UV assisted pyrolysis leads to a substantial improvement of leakage resistance properties. Polarization switching could also be obtained using capacitance-voltage (C-V) curves. The leakage current was investigated as a function of temperature. Interpretation in terms of Frenkel-Poole mechanism leads to a high trap depth in the range of 2.4 eV which is attributed to the creation of Fe2+ centres. For both microstructures investigated well saturated magnetization loops were obtained with a remnant magnetization of 2Mr = 5.4 emu/cm(3) and a coercive fields in the range of 2Hc = 200 Oe. Slightly higher saturation magnetization 2Ms of 55.4 emu/cm(3) was obtained for UV assisted pyrolysis in comparison to 45.8 emu/cm(3) for the thin films processed without UV.
引用
收藏
页码:257 / 263
页数:7
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