High voltage 4H SiC rectifiers using Pt and Ni metallization

被引:7
作者
Saxena, V [1 ]
Steckl, AJ [1 ]
机构
[1] Univ Cincinnati, Nanoelect Lab, Dept Elect & Comp Engn Comp Sci, Cincinnati, OH 45221 USA
来源
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2 | 1998年 / 264-2卷
关键词
Schottky; high voltage; rectifiers; ohmic contacts; on-resistance; barrier height;
D O I
10.4028/www.scientific.net/MSF.264-268.937
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have fabricated high voltage 4H SiC rectifier diodes using Ni and Pt as metals for the Schottky contacts. At a current density of 100 A/cm(2), these diodes had a forward voltage drop of 1.76 and 1.86 V, respectively, Both Ni- and Pt-SiC diodes had breakdown voltages > 1000 V. Pt-based SiC diodes exhibited a higher on-off current ratio ( > 10(8)) and lower ideality factor ( 1.11) at room temperature than the Ni-based diodes (> 10(6) and 1.29). The diodes were operated at elevated temperatures up to 450 degrees C for forward bias and 300 degrees C for reverse bias. The room temperature barrier height of Ni on 4H SiC was determined to be 1.31 eV and the specific on-resistance of the diodes was found to be similar to 8 m Omega-cm(2).
引用
收藏
页码:937 / 940
页数:4
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