Simulation of deep level transient spectroscopy using circuit simulator with deep level trap model implemented by Verilog-A language

被引:0
作者
Fukuda, Koichi [1 ]
Hattori, Junichi [1 ]
Asai, Hidehiro [1 ]
Shimizu, Mitsuaki [1 ]
Hashizume, Tamotsu [2 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki, Japan
[2] Hokkaido Univ, Res Ctr Integrated Quantum Elect RCIQE, Sapporo, Hokkaido, Japan
来源
2019 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES (SISPAD 2019) | 2019年
关键词
deep level transient spectroscopy; circuit simulation; compact model);
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A modeling method of deep level transient spectroscopy (DLTS) using circuit simulation with a MOS capacitor compact model which takes into account influences of deep level traps is proposed. In the proposed method, DLTS measurement procedures are described by transient analysis of circuit simulation. Stable numerical convergence is obtained even for the case in which carrier traps with wide range of time scales are included. Through case studies, it is proved that this method is a robust and versatile theoretical tool to predict DLTS signals, which helps to understand DLTS results and to optimize DLTS measurement conditions. Furthermore, the method is applied to several capacitance measurement methods discussed in literatures concerning GaIN MIS capacitors, which ensures the practical ability of the proposed simulation approach.
引用
收藏
页码:133 / 136
页数:4
相关论文
共 8 条
[1]  
[Anonymous], 2017, SMARTSPICE USERS MAN
[2]  
[Anonymous], 2008, VERILOG AMS LANGUAGE
[3]   A time-dependent Verilog-A compact model for MOS capacitors with interface traps [J].
Fukuda, Koichi ;
Asai, Hidehiro ;
Hattori, Junichi ;
Shimizu, Mitsuaki ;
Hashizume, Tamotsu .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58
[4]   A transient simulation approach to obtaining capacitance-voltage characteristics of GaN MOS capacitors with deep-level traps [J].
Fukuda, Koichi ;
Asai, Hidehiro ;
Hattori, Junichi ;
Shimizu, Mitsuaki ;
Hashizume, Tamotsu .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2018, 57 (04)
[5]   DEEP-LEVEL TRANSIENT SPECTROSCOPY - NEW METHOD TO CHARACTERIZE TRAPS IN SEMICONDUCTORS [J].
LANG, DV .
JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) :3023-3032
[6]   Positive flatband voltage shift in MOS capacitors on n-type GaN [J].
Matocha, K ;
Chow, TP ;
Gutmann, RJ .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (02) :79-81
[7]   Electrical characterization Of SiO2/n-GaN metal-insulator-semiconductor diodes [J].
Nakano, Y ;
Jimbo, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (04) :1364-1368
[8]   Subthreshold transport in mono- and multilayered MoS2 FETs [J].
Nan, Fang ;
Nagashio, Kosuke ;
Toriumi, Akira .
APPLIED PHYSICS EXPRESS, 2015, 8 (06)