Magnetostrictvie resonator;
Resonant frequency method;
Young's modulus of thin film;
MECHANICAL-PROPERTIES;
ELASTIC-MODULUS;
RESIDUAL-STRESS;
STRENGTH;
AL;
CU;
D O I:
暂无
中图分类号:
TP [自动化技术、计算机技术];
学科分类号:
0812 ;
摘要:
At present, there are many methods about Young's modulus measurement of thin films, but so far there is no recognized simple, non-destructive and cheaper standard measurement method. Considering thin films with various thicknesses were sputter deposited on the magnetostrictive resonator and monitoring the resonator's first-order longitudinal resonant frequency shift both before and after deposition induced by external magnetic field, an Young's modulus assessing method based on classical laminated plate theory is presented in this paper. Using the measured natural frequencies of Au, Cu, Cr, Al and SiC materials with various thicknesses in the literature, the Young's modulus of the five materials with various thicknesses are calculated by the method in this paper. In comparison with the Young's modulus calculated by the other methods, it is found that the calculated Young's modulus for various thicknesses are in good agreement with the Young's modulus values in the literature. Considering the simple and non-destructive characteristics of this method, which can effectively describe the effect of the thickness on the Young's modulus, it has the potential to become a standard assessing method of thin film Young's modulus.
机构:
Intel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
King, Sean W.
Antonelli, George A.
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h-index: 0
机构:
Intel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Antonelli, George A.
Stan, Gheorghe
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h-index: 0
机构:
NIST, Div Ceram, Gaithersburg, MD 20899 USA
Univ Maryland, Dept Mech Engn, College Pk, MD 20742 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Stan, Gheorghe
Cook, Robert F.
论文数: 0引用数: 0
h-index: 0
机构:
NIST, Div Ceram, Gaithersburg, MD 20899 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Cook, Robert F.
Sooryakumar, R.
论文数: 0引用数: 0
h-index: 0
机构:
Ohio State Univ, Dept Phys, Columbus, OH 43210 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Sooryakumar, R.
INSTRUMENTATION, METROLOGY, AND STANDARDS FOR NANOMANUFACTURING, OPTICS, AND SEMICONDUCTORS VI,
2012,
8466
机构:
Graduate School of Arts and Sciences, Iwate University, Morioka, UedaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Sato R.
Waki H.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of Science and Engineering, Iwate University, Morioka, UedaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Waki H.
Adachi K.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of Science and Engineering, Iwate University, Morioka, UedaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Adachi K.
Kato M.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of Engineering, Fukuyama University, Gakuencho, FukuyamaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Kato M.
Takahashi S.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of System Design, Tokyo Metropolitan University, Minami-Osawa, HachiojiGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
机构:
Intel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
King, Sean W.
Antonelli, George A.
论文数: 0引用数: 0
h-index: 0
机构:
Intel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Antonelli, George A.
Stan, Gheorghe
论文数: 0引用数: 0
h-index: 0
机构:
NIST, Div Ceram, Gaithersburg, MD 20899 USA
Univ Maryland, Dept Mech Engn, College Pk, MD 20742 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Stan, Gheorghe
Cook, Robert F.
论文数: 0引用数: 0
h-index: 0
机构:
NIST, Div Ceram, Gaithersburg, MD 20899 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Cook, Robert F.
Sooryakumar, R.
论文数: 0引用数: 0
h-index: 0
机构:
Ohio State Univ, Dept Phys, Columbus, OH 43210 USAIntel Corp, Log Technol Dev, 5200 NE Elam Young Pkwy, Hillsboro, OR 97124 USA
Sooryakumar, R.
INSTRUMENTATION, METROLOGY, AND STANDARDS FOR NANOMANUFACTURING, OPTICS, AND SEMICONDUCTORS VI,
2012,
8466
机构:
Graduate School of Arts and Sciences, Iwate University, Morioka, UedaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Sato R.
Waki H.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of Science and Engineering, Iwate University, Morioka, UedaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Waki H.
Adachi K.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of Science and Engineering, Iwate University, Morioka, UedaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Adachi K.
Kato M.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of Engineering, Fukuyama University, Gakuencho, FukuyamaGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda
Kato M.
Takahashi S.
论文数: 0引用数: 0
h-index: 0
机构:
Faculty of System Design, Tokyo Metropolitan University, Minami-Osawa, HachiojiGraduate School of Arts and Sciences, Iwate University, Morioka, Ueda