Operation of α(GH)-SiC pressure sensor at 500°C

被引:66
作者
Okojie, RS [1 ]
Ned, AA [1 ]
Kurtz, AD [1 ]
机构
[1] Kulite Semicond Prod, Leonia, NJ 07605 USA
基金
美国国家航空航天局;
关键词
pressure sensors; high temperature; 6H-SiC;
D O I
10.1016/S0924-4247(98)00009-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
6H-SiC piezoresistive pressure sensors have been batch fabricated and tested up to 500 degrees C in atmosphere. At 1000 psi, the full-scale outputs of a typical sensor are 40.66 and 20.03 mV at 23 and 500 degrees C, respectively. The full-scale linearity of -0.17% and hysteresis of 0.17% compare favorably with current silicon technology. No significant degradation in the performance characteristics is observed when the sensors are operated for 10 h at 500 degrees C. The temperature coefficient of gage factor (TCGF) exhibits negative values of -0.19 and -0.11%/degrees C at 100 and 500 degrees C, respectively. Excellent control of the diaphragm thickness is the result of a stabilized electrochemical etching process. The micromachining of bulk 6H-SiC eliminates the thermal-mismatch problem inherent in micromachined heterostructures. This work demonstrates batch manufacture and operation of 6H-SiC pressure sensors for temperatures beyond those of conventional silicon technology. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:200 / 204
页数:5
相关论文
共 9 条
[1]  
GEYLING FT, 1960, AT&T TECH J, P705
[2]  
GUK GN, 1974, SOV PHYS SEMICOND, V9, P104
[3]  
KEYES RW, 1960, SOLID STATE PHYS, V11, P1493
[4]   HIGH-VOLTAGE 6H-SIC P-N-JUNCTION DIODES [J].
MATUS, LG ;
POWELL, JA ;
SALUPO, CS .
APPLIED PHYSICS LETTERS, 1991, 59 (14) :1770-1772
[5]   alpha(6H)-SiC pressure sensors at 350 degrees C [J].
Okojie, RS ;
Ned, AA ;
Kurtz, AD ;
Carr, WN .
IEDM - INTERNATIONAL ELECTRON DEVICES MEETING, TECHNICAL DIGEST 1996, 1996, :525-528
[6]   alpha(6H)-SiC pressure sensors for high temperature applications [J].
Okojie, RS ;
Ned, AA ;
Kurtz, AD ;
Carr, WN .
NINTH ANNUAL INTERNATIONAL WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS, IEEE PROCEEDINGS: AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND SYSTEMS, 1996, :146-149
[7]   DEFORMATION AND FRACTURE OF SMALL SILICON CRYSTALS [J].
PEARSON, GL ;
READ, WT ;
FELDMANN, WL .
ACTA METALLURGICA, 1957, 5 (04) :181-191
[8]  
Shor J.S., 1993, I PHYS C SER, P523
[9]  
Sze S. M., 1985, SEMICONDUCTOR DEVICE, P33