Photo-thermal Dual Curing of Polysilane/diarylfluorene Blends -Fabrication of Films with High and Tunable Refractive Indices-

被引:3
|
作者
Okamura, Haruyuki [1 ]
Matsumoto, Akikazu [1 ]
Minokami, Keiko [2 ]
Miyauchi, Shinsuke [2 ]
机构
[1] Osaka Prefecture Univ, Dept Appl Chem, Grad Sch Engn, Naka Ku, 1-1 Gakuen Cho, Sakai, Osaka 5998531, Japan
[2] Osaka Gas Chem Co Ltd, Fine Mat Business Div, Konohana Ku, 5-11-61 Torishima, Osaka 5540051, Japan
关键词
Photo-thermal dual curing; Fluorene; Acryl; Polysilane; High refractive index; High thermal stability; PHOTO-CROSS-LINKING; THIOL; LIGHT; PHOTOPOLYMERIZATION; POLYSILANES; GENERATORS;
D O I
10.2494/photopolymer.31.503
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
We have developed the crosslinked films of diphenyl- or dinaphthylfluorene having acryl units with polymethylphenylsilane in the presence of a photoradical initiator upon irradiation at 405 nm with thermal treatments at around 100 degrees C. The photopolymerization of the acrylates effectively enhanced by the photo-thermal dual curing technique. Polysilane moieties were incorporated into the film by the termination reaction between the acrylate radicals and Si radicals generated by the slight photo-decomposition of the Si-Si bonds. We have successfully fabricated the films with high refractive indices (n(D) : 1.62) and the refractive index values were tunable by irradiation at 254 nm by the effective decomposition of the Si-Si bonds of the polysilanes. The reaction mechanism is discussed based on real-time FT-IR measurements. The prepared films have a high thermal stability (temperature for 5% weight loss, 7(d5): 300 degrees C).
引用
收藏
页码:503 / 510
页数:8
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