共 3 条
Photo-thermal Dual Curing of Polysilane/diarylfluorene Blends -Fabrication of Films with High and Tunable Refractive Indices-
被引:3
|作者:
Okamura, Haruyuki
[1
]
Matsumoto, Akikazu
[1
]
Minokami, Keiko
[2
]
Miyauchi, Shinsuke
[2
]
机构:
[1] Osaka Prefecture Univ, Dept Appl Chem, Grad Sch Engn, Naka Ku, 1-1 Gakuen Cho, Sakai, Osaka 5998531, Japan
[2] Osaka Gas Chem Co Ltd, Fine Mat Business Div, Konohana Ku, 5-11-61 Torishima, Osaka 5540051, Japan
关键词:
Photo-thermal dual curing;
Fluorene;
Acryl;
Polysilane;
High refractive index;
High thermal stability;
PHOTO-CROSS-LINKING;
THIOL;
LIGHT;
PHOTOPOLYMERIZATION;
POLYSILANES;
GENERATORS;
D O I:
10.2494/photopolymer.31.503
中图分类号:
O63 [高分子化学(高聚物)];
学科分类号:
070305 ;
080501 ;
081704 ;
摘要:
We have developed the crosslinked films of diphenyl- or dinaphthylfluorene having acryl units with polymethylphenylsilane in the presence of a photoradical initiator upon irradiation at 405 nm with thermal treatments at around 100 degrees C. The photopolymerization of the acrylates effectively enhanced by the photo-thermal dual curing technique. Polysilane moieties were incorporated into the film by the termination reaction between the acrylate radicals and Si radicals generated by the slight photo-decomposition of the Si-Si bonds. We have successfully fabricated the films with high refractive indices (n(D) : 1.62) and the refractive index values were tunable by irradiation at 254 nm by the effective decomposition of the Si-Si bonds of the polysilanes. The reaction mechanism is discussed based on real-time FT-IR measurements. The prepared films have a high thermal stability (temperature for 5% weight loss, 7(d5): 300 degrees C).
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页码:503 / 510
页数:8
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