Distributed axis electron-beam system for lithography and inspection - preliminary experimental results

被引：14

作者：

Pickard, DS ^{[1
]}

Campbell, C

Crane, T

Cruz-Rivera, LJ

Davenport, A

Meisburger, WD

Pease, RFW

Groves, TR

机构：

[1] Stanford Univ, Solid State & Photon Lab, Stanford, CA 94305 USA

[2] Leica Microsyst Lithog GmbH, D-07745 Jena, Germany

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 06期

关键词：

D O I：

10.1116/1.1520566

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A distributed-axis system can be used to avoid the space-charge limits of conventional electron-beam lithography systems. Our approach is to use a uniform magnetic field to simultaneously focus an array of beams. We have built a test bed and report the first experimental results. Sub-100 nm resolution has been obtained and is presently limited by aperture size and interference. Sub-10 nm resolution should be possible given a suitably small source. (C) 2002 American Vacuum Society.

引用

页码：2662 / 2665

页数：4

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