共 46 条
Chemical surface passivation of Ge nanowires
被引:197
作者:
Hanrath, T
[1
]
Korgel, BA
[1
]
机构:
[1] Univ Texas, Dept Chem Engn, Texas Mat Inst, Ctr Nano & Mol Sci & Technol, Austin, TX 78712 USA
关键词:
D O I:
10.1021/ja0465808
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
Surface oxidation and chemical passivation of single-crystal Ge nanowires with diameters ranging between 7 and 25 nm were studied. The surface chemistry differs significantly from that of well-studied monolithic atomically smooth single-crystal substrates. High-resolution Ge 3d XPS measurements reveal that Ge nanowires with chemically untreated surfaces exhibit greater susceptibility to oxidation than monolithic Ge substrates. Multiple solution-phase routes to Ge nanowire surface passivation were studied, including sulfidation, hydride and chloride termination, and organic monolayer passivation. Etching in HCl results in chloride-terminated surfaces, whereas HF etching leads to hydride termination with limited stability. Exposure to aqueous ammonium sulfide solutions leads to a thick glassy germanium sulfide layer. Thermally initiated hydrogermylation reactions with alkenes produce chemically stable, covalently bonded organic monolayer coatings that enable ohmic electrical contacts to be made to the nanowires.
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页码:15466 / 15472
页数:7
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