Chemical surface passivation of Ge nanowires

被引:197
作者
Hanrath, T [1 ]
Korgel, BA [1 ]
机构
[1] Univ Texas, Dept Chem Engn, Texas Mat Inst, Ctr Nano & Mol Sci & Technol, Austin, TX 78712 USA
关键词
D O I
10.1021/ja0465808
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Surface oxidation and chemical passivation of single-crystal Ge nanowires with diameters ranging between 7 and 25 nm were studied. The surface chemistry differs significantly from that of well-studied monolithic atomically smooth single-crystal substrates. High-resolution Ge 3d XPS measurements reveal that Ge nanowires with chemically untreated surfaces exhibit greater susceptibility to oxidation than monolithic Ge substrates. Multiple solution-phase routes to Ge nanowire surface passivation were studied, including sulfidation, hydride and chloride termination, and organic monolayer passivation. Etching in HCl results in chloride-terminated surfaces, whereas HF etching leads to hydride termination with limited stability. Exposure to aqueous ammonium sulfide solutions leads to a thick glassy germanium sulfide layer. Thermally initiated hydrogermylation reactions with alkenes produce chemically stable, covalently bonded organic monolayer coatings that enable ohmic electrical contacts to be made to the nanowires.
引用
收藏
页码:15466 / 15472
页数:7
相关论文
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