The etching of natural alpha-recoil tracks in mica with an argon RF-plasma discharge and their imaging via atomic force microscopy

被引:18
作者
Brown, NMD
Liu, ZH
机构
[1] Surface Science Laboratory, Dept. of Applied Physical Sciences, University of Ulster, Coleraine
关键词
SCANNING TUNNELING MICROSCOPY; HEAVY-ION IRRADIATION; GRAPHITE SURFACE; OXYGEN;
D O I
10.1016/0169-4332(95)00329-0
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The conventional technique used to reveal the natural alpha-recoil tracks, as well as other nuclear tracks, in muscovite mica is to etch the mica sheets in a concentrated hydrofluoric (HF) acid solution. However, because of the fast etching along the basal plane of the mica when using HF acid, the recoil-disturbed regions are commonly enlarged laterally so that it is difficult to determine the real size of these regions. In the present study, etching with an argon radio-frequency (RF) plasma discharge is used for the first time to locate and size the alpha-recoil tracks in the mica. The investigation of the etched tracks which followed was carried out using atomic force microscopy (AFM). From a consideration of the topography observed and of the characteristics of the interactions between the argon RF-plasma and the mica substrate, it is suggested that the etch pit dimensions as revealed by the low power argon RF-plasma discharge used and imaged by AFM correspond to the actual scales of the etchable damaged regions induced by the alpha-recoils in the mica, in contrast to those revealed by etching in HF acid. The mechanism of the preferential sputter etching observed at low power levels in an argon RF-plasma discharge at the etchable regions is discussed.
引用
收藏
页码:89 / 100
页数:12
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