Van der Waals epitaxy of topological insulator Bi2Se3 on single layer transition metal dichalcogenide MoS2

被引:20
|
作者
Chen, K. H. M. [1 ]
Lin, H. Y. [1 ]
Yang, S. R. [1 ]
Cheng, C. K. [2 ,3 ]
Zhang, X. Q. [4 ]
Cheng, C. M. [5 ]
Lee, S. F. [6 ]
Hsu, C. H. [5 ]
Lee, Y. H. [4 ]
Hong, M. [2 ,3 ]
Kwo, J. [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Phys, Hsinchu 30013, Taiwan
[2] Natl Taiwan Univ, Grad Inst Appl Phys, Taipei 10617, Taiwan
[3] Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan
[4] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu 30013, Taiwan
[5] Natl Synchrotron Radiat Res Ctr, Hsinchu 30076, Taiwan
[6] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
关键词
MOLECULAR-BEAM EPITAXY; GROWTH; MOBILITY;
D O I
10.1063/1.4989805
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the growth of high quality topological insulator Bi2Se3 thin films on a single layer, transitional metal dichalcogenide MoS2 film via van der Waals epitaxy in a planar geometry. In stark contrast to the reported growth of using 3-D crystalline substrates such as Al2O3(0001), Bi2Se3 thin films grown on a 2-D template made of single layer MoS2 showed excellent crystallinity starting immediately from the growth of the first quintuple layer. Excellent crystallinity of Bi2Se3 thin films is attained, with the increased size of the triangular shaped Bi2Se3 domains and 2-3 times enhancement in mobility, along with the observation of Shubnikov-de Haas oscillations in the magnetoresistance. Our approach of adopting a van der Waals type template may be extended to the thin film growth of other low dimensional layered materials. Published by AIP Publishing.
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页数:5
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