Characteristics of CuCr1-xMgxO2 films prepared by pulsed laser deposition

被引:35
作者
Li, Da [1 ]
Fang, Xiaodong [1 ]
Deng, Zanhong [1 ]
Dong, Weiwei [1 ]
Ta, Ruhua [1 ]
Zhou, Shu [1 ]
Wang, Jinmei [1 ]
Wang, Tao [1 ]
Zha, Yiping [1 ]
Zhu, Xuebin [2 ]
机构
[1] Chinese Acad Sci, Key Lab New Thin Films Solar Cells, Anhui Inst Opt & Fine Mech, Hefei 230031, Peoples R China
[2] Chinese Acad Sci, Key Lab New Thin Films Solar Cells, Inst Solid State Phys, Hefei 230031, Peoples R China
关键词
Thin films; Laser processing; Electrical transport; Optical properties; TRANSPARENT THIN-FILMS; P-N-JUNCTIONS; ELECTRICAL-CONDUCTION; OXIDE; DELAFOSSITE; FABRICATION; GROWTH; TEMPERATURE; OXYGEN;
D O I
10.1016/j.jallcom.2009.06.174
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
High-quality c-axis oriented CuCr1-xMgxO2 (0 <= x <= 0.05) thin films were prepared by pulsed laser deposition (PLD) technique. The Mg-doped CuCrO2 films can be obtained at lower substrate temperature compared to the pure CuCrO2 film. The growing rates of CuCr1-xMgxO2 films deposited with different pulse energy densities are different; the different pulse energy densities result in different grain sizes on the surface of these CuCr1-xMgxO2 films. The CuCr1-xMgxO2 films with high transmittance for certain wavelength can be obtained by controlling the thicknesses of CuCr1-xMgxO2 films. The maximal transmittance of CuCr1-xMgxO2 films can reach 75% in the visible region. Optical transmission data of CuCr1-xMgxO2 films indicate a direct band gap of 3.2 eV. All the films behave as semiconductors. Upon doping with 5% Mg, the resistivity of CuCrO2 films decreases from 67 to 0.025 Omega cm. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:462 / 467
页数:6
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