Minority carrier diffusion length and lifetime for electrons in a type-II InAs/GaSb superlattice photodiode

被引:24
作者
Li, JV
Chuang, SL
Jackson, EM
Aifer, E
机构
[1] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
[2] SFA Inc, Largo, MD 20774 USA
[3] USN, Res Lab, Washington, DC 20375 USA
关键词
D O I
10.1063/1.1787598
中图分类号
O59 [应用物理学];
学科分类号
摘要
We use the electron-beam-induced current (EBIC) technique to investigate carrier transport characteristics in a type-II InAs/GaSb superlattice photodiode with cutoff wavelength at 7.7 mum. We use a theoretical model that includes an extended generation source and depletion region to simulate the EBIC current on both sides of the p-n junction. The electron minority diffusion length in the p-superlattice, L-e, is extracted from the simulation, from which the electron lifetime tau(e) is obtained. L-e increases from 0.275 mum at 5.3 K to 0.355 mum at 100 K. tau(e) drops from 1.5 ns at 5.3 K to 0.13 ns at 100 K. (C) 2004 American Institute of Physics.
引用
收藏
页码:1984 / 1986
页数:3
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