CVD diamond growth from nanodiamond seeds buried under a thin chromium layer

被引:11
作者
Degutis, G. [1 ]
Pobedinskas, P. [1 ,2 ]
Turner, S. [3 ]
Lu, Y. -G. [3 ,4 ,5 ]
Al Riyami, S. [1 ,4 ,5 ,6 ]
Ruttens, B. [2 ]
Yoshitake, T. [4 ,5 ]
D'Haen, J. [2 ]
Haenen, K. [1 ,2 ]
Verbeeck, J. [3 ]
Hardy, A. [1 ,2 ]
Van Bael, M. K. [1 ,2 ]
机构
[1] Hasselt Univ, Inst Mat Res IMO, B-3500 Hasselt, Belgium
[2] IMEC VZW, IMOMEC, B-3590 Diepenbeek, Belgium
[3] Univ Antwerp, EMAT, B-2020 Antwerp, Belgium
[4] Univ N Carolina, Dept Mech Engn & Engn Sci, Charlotte, NC 28223 USA
[5] Kyushu Univ, 6-1 Kasuga, Fukuoka 8168580, Japan
[6] German Univ Technol Oman, Barka, Oman
关键词
CVD diamond; Cr diffusion; Cr carburization; Si-Cr interface; MECHANICAL-PROPERTIES; NUCLEATION; DEPOSITION; SUBSTRATE; MICROWAVE; SILICIDE; KINETICS; FILMS;
D O I
10.1016/j.diamond.2016.02.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This work presents a morphological and structural analysis of CVD diamond growth on silicon from nanodiamond seeds covered by a 50 nm thick chromium layer. The role of carbon diffusion as well as chromium and carbon silicide formation is analyzed. The local diamond environment is investigated by scanning transmission electron microscopy in combination with electron energy-loss spectroscopy. The evolution of the diamond phase composition (sp(3)/sp(2)) is evaluated by micro-Raman spectroscopy. Raman and X-ray diffraction analysis are used to identify the interfacial phases formed during CVD growth. Based upon the observed morphological and structural evolution, a diamond growth model from nanodiamond seeds buried beneath a thin Cr layer is proposed. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:163 / 168
页数:6
相关论文
共 30 条
[1]   Interdiffusion and growth of chromium silicide at the interface of Cr/Si(As) system during rapid thermal annealing [J].
Benkherbache, H. ;
Merabet, A. .
THIN SOLID FILMS, 2010, 518 (09) :2370-2373
[2]   GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON [J].
BOWER, RW ;
MAYER, JW .
APPLIED PHYSICS LETTERS, 1972, 20 (09) :359-&
[3]   Core-Shell Chromium Silicide-Silicon Nanopillars: A Contact Material for Future Nanosystems [J].
Chang, Mu-Tung ;
Chen, Chih-Yen ;
Chou, Li-Jen ;
Chen, Lih-Juann .
ACS NANO, 2009, 3 (11) :3776-3780
[4]   CVD diamond tool performance in metal matrix composite machining [J].
Chou, YK ;
Liu, J .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (5-6) :1872-1878
[5]   Silicide interfaces in silicon technology [J].
d'Heurle, FM .
JOURNAL OF ELECTRONIC MATERIALS, 1998, 27 (11) :1138-1147
[6]   Improved nanodiamond seeding on chromium by surface plasma pretreatment [J].
Degutis, G. ;
Pobedinskas, P. ;
Boyen, H. -G. ;
Dexters, W. ;
Janssen, W. ;
Drijkoningen, S. ;
Hardy, A. ;
Haenen, K. ;
Van Bael, M. K. .
CHEMICAL PHYSICS LETTERS, 2015, 640 :50-54
[7]   DIAMOND DEPOSITION ON CHROMIUM, COBALT AND NICKEL SUBSTRATES BY MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION [J].
HAUBNER, R ;
LINDLBAUER, A ;
LUX, B .
DIAMOND AND RELATED MATERIALS, 1993, 2 (12) :1505-1515
[8]   Diamond deposition on hardmetal substrates - Comparison of substrate pre-treatments and industrial applications [J].
Haubner, R. ;
Kalss, W. .
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 2010, 28 (04) :475-483
[9]   DIAMOND SYNTHESIS ON A METAL-SUBSTRATE [J].
KAWARADA, M ;
KURIHARA, K ;
SASAKI, K .
DIAMOND AND RELATED MATERIALS, 1993, 2 (5-7) :1083-1089
[10]   GROWTH AND OPTICAL CHARACTERIZATION OF CRSI2 THIN-FILMS [J].
LANGE, H ;
GIEHLER, M ;
HENRION, W ;
FENSKE, F ;
SIEBER, I ;
OERTEL, G .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1992, 171 (01) :63-76