Passivation of aluminum with alkyl phosphonic acids for biochip applications

被引：36

作者：

Attavar, Sachin ^{[1
]}

Diwekar, Mohit ^{[1
]}

Linford, Matthew R. ^{[2
]}

Davis, Mark A. ^{[3
]}

Blair, Steve ^{[1
]}

机构：

[1] Univ Utah, Dept Elect Engn, Salt Lake City, UT 84112 USA

[2] Brigham Young Univ, Dept Chem & Biochem, Provo, UT 84602 USA

[3] MOXTEK Inc, Orem, UT 84057 USA

来源：

APPLIED SURFACE SCIENCE | 2010年 / 256卷 / 23期

关键词：

Biosenor; DNA metallic microarray; Phosphonic acid self-assembled monolayer; SELF-ASSEMBLED MONOLAYERS; ALKANEPHOSPHATE MONOLAYERS; SURFACE MODIFICATION; ADSORPTION; MOLECULES; TITANIUM;

D O I：

10.1016/j.apsusc.2010.05.041

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450: 1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：7146 / 7150

页数：5

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