A SEXAFS investigation of self-assembled monolayers on silver

被引：25

作者：

Hutt, DA ^{[1
]}

Cooper, E ^{[1
]}

Leggett, GJ ^{[1
]}

机构：

[1] Univ Nottingham, Dept Mat Engn & Mat Design, Nottingham NG7 2RD, England

来源：

SURFACE SCIENCE | 1998年 / 397卷 / 1-3期

基金：

英国工程与自然科学研究理事会;

关键词：

alkylthiols; near edge extended X-ray absorption fine structure; photochemistry; self-assembly; silver; surface extended X-ray absorption fine structure;

D O I：

10.1016/S0039-6028(97)00727-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Sulfur K-edge surface extended X-ray absorption fine structure (SEXAFS) measurements have been carried out on self-assembled monolayers (SAMs) of alkylthiols adsorbed onto evaporated silver surfaces. By using the Auger yield method, it was found that adequate data could be obtained to allow a preliminary determination of the adsorption site of the S head groups on the predominantly (111) Ag surface. For SAMs of butanethiol and octanethiol, the three-fold hollow site was identified as the most probable position for the S atom. In addition to studies of as-prepared monolayers, the evolution of the NEXAFS spectra of octanethiol SAMs on silver which were progressively photo-oxidised was also investigated. The results supported the model derived for this process from other techniques. (C) 1998 Elsevier Science B.V.

引用

页码：154 / 163

页数：10

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