Pulsed Laser Deposition of the Ni-Base Superalloy Films

被引：3
作者：
Shin, Joonghan [1 ]
Mazumder, Jyotirmoy [1 ]
机构：
[1] Univ Michigan, Ctr Lasers & Plasmas Adv Mfg, Ann Arbor, MI 48109 USA
来源：
METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE | 2016年 / 47A卷 / 03期
基金：
美国国家科学基金会;
关键词：
DIRECT METAL-DEPOSITION; ALLOYING BEHAVIOR; THIN-FILMS; MICROSTRUCTURE; INCONEL-625; NI3AL;
D O I：
10.1007/s11661-015-3289-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Ni-base superalloy films were deposited on single-crystal (SC) Ni-base superalloy substrates from a target with the same alloy composition by pulsed laser deposition (PLD) technique. Microstructure and growth behavior of the films deposited were investigated by X-ray diffraction and scanning electron microscopy, and atomic force microscope. The homoepitaxial growth of the SC Ni-base superalloy film occurred at the 1123 K (850 degrees C) substrate temperature and 2 J/cm(2) pulse energy. Films generally exhibited a strong polycrystalline characteristic as the substrate temperature and pulse energy increased. The SC film had a smooth surface. The measured root mean square roughness of the SC film surface was similar to 6 nm. Based on the Taguchi analysis, the substrate temperature and pulse energy were the most significant process parameters influencing the structural characteristics of the films. Also, the influence of the pulse repletion rate and deposition time was not found to be significant. (C) The Minerals, Metals & Materials Society and ASM International 2016
引用
收藏
页码：1240 / 1247
页数：8
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