共 24 条
[1]
[Anonymous], 1999, PRINCIPLES OPTICS EL
[4]
REFINEMENT OF OPTICAL MULTILAYER SYSTEMS WITH DIFFERENT OPTIMIZATION PROCEDURES
[J].
APPLIED OPTICS,
1990, 29 (19)
:2876-2893
[5]
Extreme ultraviolet lithography
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1998, 16 (06)
:3142-3149
[8]
OPTIMIZATION OF LAYERED SYNTHETIC MICROSTRUCTURES FOR NARROW-BAND REFLECTIVITY AT SOFT-X-RAY AND EUV WAVELENGTHS
[J].
APPLIED OPTICS,
1986, 25 (16)
:2757-2763
[9]
SINGH M, IN PRESS APPL OPT
[10]
MOLYBDENUM BERYLLIUM MULTILAYER MIRRORS FOR NORMAL INCIDENCE IN THE EXTREME-ULTRAVIOLET
[J].
APPLIED OPTICS,
1995, 34 (19)
:3727-3730