Improved theoretical reflectivities of extreme ultraviolet mirrors

被引:8
作者
Singh, M [1 ]
Braat, JJM [1 ]
机构
[1] Delft Univ Technol, Fac Sci Appl, Opt Res Grp, NL-2628 CJ Delft, Netherlands
来源
EMERGING LITHOGRAPHIC TECHNOLOGIES IV | 2000年 / 3997卷
关键词
thin film optics; multilayers; distributed Bragg reflectors; extreme ultraviolet lithography; optimization;
D O I
10.1117/12.390078
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We show that the theoretical reflectivities of multilayered Mo/Be and Mo/Si extreme ultraviolet (EUV) mirrors tuned for the 11-14 nm spectral region can be enhanced significantly by incorporating additional materials within the stack. The reflectivity performance of these quarter-wave multilayers can be enhanced further by global optimization procedures by which the layer thicknesses are varied for optimum performance. By incorporating additional materials of differing complex refractive indices - e.g. Rh, Ru and Sr - in various regions of the stack we calculate peak reflectivity enhancements of up to similar to 5% for a single reflector compared to standard unoptimized stacks. For an EUV optical system with nine near-normal-incidence mirrors, the theoretical optical throughput may be increased by up to 100%. We also show that protective capping layers such as Rh and Ru, in addition to protecting the mirrors from environmental attack, may serve to improve the reflectivity characteristics.
引用
收藏
页码:412 / 419
页数:8
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