Effect of grain orientation on the nitriding rate of a nickel base alloy studied by electron backscatter diffraction

被引:56
作者
He, H
Czerwiec, T
Dong, C
Michel, H
机构
[1] Ecole Mines, Lab Sci & Genie Surfaces, UMR CNRS 7570, F-54042 Nancy, France
[2] Dalian Univ Technol, State Key Lab Mat Modificat Laser Ion & Electron, Dalian 116024, Peoples R China
关键词
electron backscattering diffraction; nitriding; nickel alloy; nitrogen; anisotropic diffusion;
D O I
10.1016/S0257-8972(02)00611-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electron backscatter diffraction is a rather new and powerful technique that provides local orientation. In this paper we present an investigation on cross-sections of a nickel base alloy (Inconel 690) treated by low temperature plasma assisted nitriding. The studied alloy presents non-uniform nitrided layer thickness from grain to grain. A linear relationship is found between the thickness of the nitrided layer within a surface grain and the minimum angle between nitriding direction and the <100> crystal direction. This angle characterizes the orientation of the grain beneath the nitrided layer. Deeper diffusion is observed in grains with orientation close to <100> than in those grains with orientation close to <111>. An anisotropic dependence of the stress on the strain is proposed to explain these phenomena. The consequences of the interpretation of X-ray diffraction pattern and nitrogen depth profiles of the nitrided layer are discussed. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:331 / 338
页数:8
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