Electrons as "Invisible Ink": Fabrication of Nanostructures by Local Electron Beam Induced Activation of SiOx

被引：68

作者：

Walz, Marie-Madeleine

Schirmer, Michael

Vollnhals, Florian

Lukasczyk, Thomas

Steinrueck, Hans-Peter

Marbach, Hubertus ^{[1
]}

机构：

[1] Univ Erlangen Nurnberg, Lehrstuhl Phys Chem 2, D-91058 Erlangen, Germany

来源：

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION | 2010年 / 49卷 / 27期

关键词：

crystal growth; electron microscopy; iron; nanotechnology; silicon oxide; INDUCED DEPOSITION; DECOMPOSITION; NUCLEATION; DESORPTION; NANOSHEETS; LAYERS;

D O I：

10.1002/anie.201001308

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Figure Presented Beam me up: A novel two-step process allows iron nanostructures to be generated locally on SiOx/Si at 300 K. The surface is first locally activated by an electron beam. Then the activated structures are exposed to [Fe(CO)5], which decomposes and grows autocatalytically to give pure Fe nanocrystals. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

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页码：4669 / 4673

页数：5

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