共 37 条
Advanced oxidation removal of NO and SO2 from flue gas by using ultraviolet/H2O2/NaOH process
被引:80
作者:
Liu, Yangxian
[1
]
Wang, Qian
[1
]
Yin, Yanshan
[2
]
Pan, Jianfeng
[1
]
Zhang, Jun
[3
]
机构:
[1] Jiangsu Univ, Sch Energy & Power Engn, Zhenjiang 212013, Jiangsu, Peoples R China
[2] Changsha Univ Sci & Technol, Dept Hunan Prov, Key Lab Efficient & Clean Energy Utilizat Educ, Changsha 410000, Hunan, Peoples R China
[3] Southeast Univ, Key Lab Energy Thermal Convers & Control, Minist Educ, Nanjing 210096, Jiangsu, Peoples R China
基金:
中国博士后科学基金;
中国国家自然科学基金;
关键词:
UV (Ultraviolet)/H2O2;
Advanced oxidation;
Flue gas;
NO;
SO2;
NaOH;
PHOTO-FENTON-LIKE;
NITRIC-OXIDE;
T-BUTANOL;
SIMULTANEOUS ABSORPTION;
AQUEOUS-SOLUTIONS;
MASS-TRANSFER;
WET REMOVAL;
KINETICS;
MECHANISMS;
OZONATION;
D O I:
10.1016/j.cherd.2013.12.015
中图分类号:
TQ [化学工业];
学科分类号:
0817 ;
摘要:
In this article, the effects of several process parameters (energy density per unit solution, H2O2 concentration, NaOH concentration, gas flow, solution temperature, NO concentration, O-2 concentration, SO2 concentration, Fe2+ concentration and t-butanol concentration) on removal of NO from flue gas by UV (Ultraviolet)/H2O2 advanced oxidation combining with NaOH absorption (UV/H2O2/NaOH process) were investigated in a photochemical reactor. The results indicate that under all experimental conditions, SO2 can be removed completely. Increasing H2O2 concentration, NaOH concentration, energy density per unit solution, t-butanol concentration and low concentration of Fe2+ have a significant role in promoting removal of NO. NO removal efficiency sharply reduces with the increase of gas flow, NO concentration and high concentration of Fe2+. NO removal is slightly inhibited by increasing solution temperature and SO2 concentration, but is slightly enhanced by increasing O-2 concentration. Oxidation of NO by (OH)-O-center dot free radicals plays an important role in the removal of NO by UV/H2O2/NaOH process. NO3- is the final reaction product of NO removal by UV/H2O2/NaOH process. The reaction mechanism of NO removal by UV/H2O2/NaOH process has also been proposed. (c) 2014 The Institution of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
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页码:1907 / 1914
页数:8
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