Advanced oxidation removal of NO and SO2 from flue gas by using ultraviolet/H2O2/NaOH process

被引:80
作者
Liu, Yangxian [1 ]
Wang, Qian [1 ]
Yin, Yanshan [2 ]
Pan, Jianfeng [1 ]
Zhang, Jun [3 ]
机构
[1] Jiangsu Univ, Sch Energy & Power Engn, Zhenjiang 212013, Jiangsu, Peoples R China
[2] Changsha Univ Sci & Technol, Dept Hunan Prov, Key Lab Efficient & Clean Energy Utilizat Educ, Changsha 410000, Hunan, Peoples R China
[3] Southeast Univ, Key Lab Energy Thermal Convers & Control, Minist Educ, Nanjing 210096, Jiangsu, Peoples R China
基金
中国博士后科学基金; 中国国家自然科学基金;
关键词
UV (Ultraviolet)/H2O2; Advanced oxidation; Flue gas; NO; SO2; NaOH; PHOTO-FENTON-LIKE; NITRIC-OXIDE; T-BUTANOL; SIMULTANEOUS ABSORPTION; AQUEOUS-SOLUTIONS; MASS-TRANSFER; WET REMOVAL; KINETICS; MECHANISMS; OZONATION;
D O I
10.1016/j.cherd.2013.12.015
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
In this article, the effects of several process parameters (energy density per unit solution, H2O2 concentration, NaOH concentration, gas flow, solution temperature, NO concentration, O-2 concentration, SO2 concentration, Fe2+ concentration and t-butanol concentration) on removal of NO from flue gas by UV (Ultraviolet)/H2O2 advanced oxidation combining with NaOH absorption (UV/H2O2/NaOH process) were investigated in a photochemical reactor. The results indicate that under all experimental conditions, SO2 can be removed completely. Increasing H2O2 concentration, NaOH concentration, energy density per unit solution, t-butanol concentration and low concentration of Fe2+ have a significant role in promoting removal of NO. NO removal efficiency sharply reduces with the increase of gas flow, NO concentration and high concentration of Fe2+. NO removal is slightly inhibited by increasing solution temperature and SO2 concentration, but is slightly enhanced by increasing O-2 concentration. Oxidation of NO by (OH)-O-center dot free radicals plays an important role in the removal of NO by UV/H2O2/NaOH process. NO3- is the final reaction product of NO removal by UV/H2O2/NaOH process. The reaction mechanism of NO removal by UV/H2O2/NaOH process has also been proposed. (c) 2014 The Institution of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:1907 / 1914
页数:8
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